⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30096756 | 0.80 | ALDH1A1 (0.43) | — | |
| SCHEMBL596654 | 0.80 | ALDH1A1 (0.43) | — | |
| Hydrochloric Acid SCHEMBL6028543 | 0.78 | ALDH1A1 (0.42) | — | |
| SCHEMBL6887935 | 0.78 | ALDH1A1 (0.42) | — | |
| SCHEMBL2855507 | 0.77 | ALDH1A1 (0.46) | — | |
| SCHEMBL2858201 | 0.76 | ALDH1A1 (0.50) | — | |
| SCHEMBL1444159 | 0.76 | ALDH1A1 (0.50) | — | |
| SCHEMBL30096746 | 0.76 | — | — | |
| SCHEMBL288128 | 0.76 | — | — | |
| SCHEMBL2582323 | 0.76 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117210028-B | Brilliant blue disperse dye and preparation method and application thereof | 上海安诺其集团股份有限公司 | 2024-01-30 | — | — | CN | disclosed |
| CN-117210028-A | Brilliant blue disperse dye and preparation method and application thereof | 上海安诺其集团股份有限公司 | 2023-12-12 | — | — | CN | disclosed |
| US-9242963-B2 | Organic compounds | NOVARTIS AG (CH) | 2016-01-26 | — | — | US | disclosed |
| US-20150210672-A1 | ORGANIC COMPOUNDS | NOVARTIS AG (CH) | 2015-07-30 | — | — | US | disclosed |
| US-20140288126-A1 | ORGANIC COMPOUNDS | NOVARTIS AG (CH) | 2014-09-25 | — | — | US | disclosed |
| CN-102439520-B | Photosensitive resin composition | ASAHI KASEI E MATERIALS CORP | 2014-08-27 | — | — | CN | disclosed |
| CN-103988127-A | Photosensitive resin composition, method for producing cured relief pattern, semiconductor device, and display device | ASAHI KASEI E MATERIALS CORP | 2014-08-13 | — | — | CN | disclosed |
| US-8791141-B2 | Organic compounds | NOVARTIS AG (CH) | 2014-07-29 | — | — | US | disclosed |
| CN-102439520-A | Photosensitive resin composition | ASAHI KASEI E MATERIALS CORP | 2012-05-02 | — | — | CN | disclosed |
| US-8030334-B2 | Organic compounds | NOVARTIS AG (CH) | 2011-10-04 | — | — | US | disclosed |
| EP-2307371-A2 | ORGANIC COMPOUNDS | Novartis AG (CH) | 2011-04-13 | — | — | EP | disclosed |
| US-20110082129-A1 | ORGANIC COMPOUNDS | NOVARTIS AG (CH) | 2011-04-07 | — | — | US | disclosed |
| US-20100261698-A1 | ORGANIC COMPOUNDS | NOVARTIS AG (CH) | 2010-10-14 | — | — | US | disclosed |
| WO-2009156462-A2 | ORGANIC COMPOUNDS | NOVARTIS AG (CH) | 2009-12-30 | — | — | WO | disclosed |
| CN-100537581-C | Cyclic petroleum phosphate compound and its preparation | UNIV BEIJING (CN) | 2009-09-09 | — | — | CN | disclosed |
| CN-1709898-A | Cyclic petroleum phosphate compound and its preparation | UNIV BEIJING (CN) | 2005-12-21 | — | — | CN | disclosed |