Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA12 | O43570 | 3/20 | 0.47 |
| ▸ | CA1 | P00915 | 3/20 | 0.47 |
| ▸ | CA2 | P00918 | 3/20 | 0.47 |
| ▸ | CA9 | Q16790 | 3/20 | 0.47 |
| ▸ | CA14 | Q9ULX7 | 3/20 | 0.47 |
| ▸ | BCHE | P06276 | 1/20 | 0.44 |
| ▸ | ACHE | P22303 | 1/20 | 0.44 |
| ▸ | CYTH2 | Q99418 | 1/20 | 0.44 |
| ▸ | CA3 | P07451 | 2/20 | 0.43 |
| ▸ | CA4 | P22748 | 2/20 | 0.43 |
| ▸ | CA6 | P23280 | 2/20 | 0.43 |
| ▸ | CA5A | P35218 | 2/20 | 0.43 |
| ▸ | CA7 | P43166 | 2/20 | 0.43 |
| ▸ | CA13 | Q8N1Q1 | 2/20 | 0.43 |
| ▸ | CA5B | Q9Y2D0 | 2/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.42 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.42 |
| ▸ | TSHR | P16473 | 2/20 | 0.42 |
| ▸ | KCNJ1 | P48048 | 1/20 | 0.42 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10918768 | 0.87 | ALDH1A1 (0.56) | CA12CA1CA2CA9CA14 | |
| SCHEMBL8665553 | 0.84 | ALDH1A1 (0.44) | CYTH2ALDH1A1TDP1TSHRPOLB | |
| SCHEMBL8665555 | 0.84 | ALDH1A1 (0.44) | CYTH2ALDH1A1TDP1TSHRPOLB | |
| SCHEMBL283802 | 0.83 | CYP1A2 (0.48) | CYTH2ALDH1A1TDP1TSHRPOLB | |
| SCHEMBL283799 | 0.83 | CYP1A2 (0.48) | CYTH2ALDH1A1TDP1TSHRPOLB | |
| SCHEMBL6929015 | 0.81 | TAS2R14 (0.43) | CA12CA1CA2CA9CA14 | |
| SCHEMBL10340535 | 0.78 | CYP3A4 (0.55) | ALDH1A1TDP1TSHRMAPTPDE2A | |
| SCHEMBL17978554 | 0.77 | CYP19A1 (0.45) | CA12CA1CA2CA9CA5A | |
| SCHEMBL17978552 | 0.77 | CYP19A1 (0.45) | CA12CA1CA2CA9CA5A | |
| SCHEMBL1607271 | 0.77 | ACHE (0.46) | CA12CA1CA2CA9CA14 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108659223-B | Cyclodextrin derivative type photosensitive resin, preparation method thereof, resist composition based on cyclodextrin derivative type photosensitive resin and application of resist composition | 中科院广州化学有限公司南雄材料生产基地 | 2020-12-04 | — | — | CN | disclosed |
| CN-105467763-A | Compound used for photoresist composition | ZHEJIANG YONGTAI NEW MAT CO LTD | 2016-04-06 | — | — | CN | disclosed |
| CN-104536265-A | Photoresist composition | ZHEJIANG YONGTAI TECHNOLOGY CO LTD | 2015-04-22 | — | — | CN | disclosed |
| CN-104423157-A | Curable composition | TOKYO OHKA KOGYO CO LTD | 2015-03-18 | — | — | CN | disclosed |
| CN-102597874-B | Stabilizers for vinyl ether resist formulations for imprint lithography | IBM | 2014-09-24 | — | — | CN | disclosed |
| US-8795951-B2 | Material for forming resist sensitization film and production method of semiconductor device | FUJITSU LIMITED (JP) | 2014-08-05 | — | — | US | disclosed |
| CN-103941538-A | Hardmask surface treatment | ROHM & HAAS ELECT MAT | 2014-07-23 | — | — | CN | disclosed |
| CN-103941547-A | Hardmask Surface Treatment | ROHM & HAAS ELECT MAT | 2014-07-23 | — | — | CN | disclosed |
| US-20110081615-A1 | MATERIAL FOR FORMING RESIST SENSITIZATION FILM AND PRODUCTION METHOD OF SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2011-04-07 | — | — | US | disclosed |
| US-20080070998-A1 | Foam Production Method | OJI PAPER CO., LTD. (JP) | 2008-03-20 | — | — | US | disclosed |
| EP-1795553-A1 | PROCESS FOR PRODUCING FOAM | Oji Paper Co., Ltd. (JP) | 2007-06-13 | — | — | EP | disclosed |
| US-20060210785-A1 | Foamed product in a sheet form and method for production thereof | OJI PAPER CO., LTD. (JP) | 2006-09-21 | — | — | US | disclosed |
| EP-0880075-B1 | Radiation sensitive resin composition | JSR CORP (JP) | 2001-10-17 | — | — | EP | disclosed |
| US-5958648-A | Radiation sensitive resin composition | JSR CORPORATION (JP) | 1999-09-28 | — | — | US | disclosed |
| EP-0880075-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 1998-11-25 | — | — | EP | disclosed |