Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LTA4H | P09960 | 3/20 | 0.46 |
| ▸ | MLNR | O43193 | 1/20 | 0.38 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.38 |
| ▸ | ESR1 | P03372 | 1/20 | 0.38 |
| ▸ | NR3C1 | P04150 | 1/20 | 0.38 |
| ▸ | PGR | P06401 | 1/20 | 0.38 |
| ▸ | ADRB2 | P07550 | 1/20 | 0.38 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.38 |
| ▸ | ADRB1 | P08588 | 1/20 | 0.38 |
| ▸ | HTR1A | P08908 | 1/20 | 0.38 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.38 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.38 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.38 |
| ▸ | DRD2 | P14416 | 1/20 | 0.38 |
| ▸ | ADRA2B | P18089 | 1/20 | 0.38 |
| ▸ | ADRA2C | P18825 | 1/20 | 0.38 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.38 |
| ▸ | MAOA | P21397 | 1/20 | 0.38 |
| ▸ | CNR1 | P21554 | 1/20 | 0.38 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7561605 | 0.92 | LTA4H (0.44) | LTA4HMLNRNR1I2ESR1NR3C1 | |
| SCHEMBL704371 | 0.90 | KCNA3 (0.41) | LTA4HDRD2DRD3KCNH2KCNA3 | |
| SCHEMBL705384 | 0.90 | KCNA3 (0.41) | LTA4HDRD2DRD3KCNH2KCNA3 | |
| SCHEMBL1596973 | 0.88 | LTA4H (0.39) | LTA4HMLNRNR1I2ESR1NR3C1 | |
| SCHEMBL705837 | 0.85 | CA4 (0.42) | LTA4HKCNH2KCNA3ALDH1A1LMNA | |
| SCHEMBL703549 | 0.84 | LTA4H (0.46) | LTA4HMLNRNR1I2ESR1NR3C1 | |
| SCHEMBL6987433 | 0.84 | LTA4H (0.46) | LTA4HMLNRNR1I2ESR1NR3C1 | |
| SCHEMBL3917624 | 0.82 | KCNA3 (0.35) | LTA4HKCNH2KCNA3TSHRRECQL | |
| SCHEMBL3923262 | 0.82 | KCNA3 (0.40) | LTA4HESR1CHRM2HTR1AADRA2A | |
| SCHEMBL3350911 | 0.82 | HDAC3 (0.46) | LTA4HSLC6A2SLC6A4KCNA3TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116075368-B | Resin composition, cured product, method for producing same, and laminate | 三菱化学株式会社 | 2024-06-11 | — | — | CN | disclosed |
| CN-116075368-A | Resin composition, cured product, method for producing same, and laminate | 三菱化学株式会社 | 2023-05-05 | — | — | CN | disclosed |
| CN-108389512-B | Laminate, flexible device, and method for producing laminate | 东京应化工业株式会社 | 2022-04-15 | — | — | CN | disclosed |
| CN-108250754-B | Silicon-containing resin composition, silicon-containing resin film, silica film, light-emitting display element panel, and light-emitting display device | 东京应化工业株式会社 | 2022-01-25 | — | — | CN | disclosed |
| CN-108387954-B | Laminate, flexible device, and method for producing laminate | 东京应化工业株式会社 | 2022-01-18 | — | — | CN | disclosed |
| CN-107709464-B | Silicon-containing resin composition | 东京应化工业株式会社 | 2021-09-28 | — | — | CN | disclosed |
| CN-112334795-A | Liquid composition, quantum dot-containing film, optical film, light-emitting display element panel, and light-emitting display device | 东京应化工业株式会社 | 2021-02-05 | — | — | CN | disclosed |
| CN-107429059-B | Energy-sensitive resin composition | 东京应化工业株式会社 | 2020-10-23 | — | — | CN | disclosed |
| CN-107922733-B | Polyimide precursor composition | 东京应化工业株式会社 | 2020-09-11 | — | — | CN | disclosed |
| US-9870924-B2 | Diffusion agent composition, method of forming impurity diffusion layer, and solar cell | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-01-16 | — | — | US | disclosed |
| US-20130252099-A1 | NEGATIVE ELECTRODE BASE MEMBER | KANTO GAKUIN UNIVERSITY SURFACE ENGINEERING RESEARCH INSTITUTE (JP) | 2013-09-26 | — | — | US | disclosed |
| US-8475690-B2 | Diffusing agent composition, method of forming impurity diffusion layer, and solar battery | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-07-02 | — | — | US | disclosed |
| US-20130109123-A1 | DIFFUSING AGENT COMPOSITION AND METHOD OF FORMING IMPURITY DIFFUSION LAYER | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-05-02 | — | — | US | disclosed |
| EP-2573800-A1 | DIFFUSION AGENT COMPOSITION, METHOD OF FORMING AN IMPURITY DIFFUSION LAYER, AND SOLAR CELL | Tokyo Ohka Kogyo Co., Ltd. (JP) | 2013-03-27 | — | — | EP | disclosed |
| US-20130061922-A1 | DIFFUSION AGENT COMPOSITION, METHOD OF FORMING IMPURITY DIFFUSION LAYER, AND SOLAR CELL | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-03-14 | — | — | US | disclosed |
| EP-2472655-A1 | Negative electrode base member | Tokyo Ohka Kogyo Co., Ltd. (JP) | 2012-07-04 | — | — | EP | disclosed |
| US-20110079262-A1 | DIFFUSING AGENT COMPOSITION, METHOD OF FORMING IMPURITY DIFFUSION LAYER, AND SOLAR BATTERY | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-04-07 | — | — | US | disclosed |
| US-20110017291-A1 | DIFFUSING AGENT COMPOSITION FOR INK-JET, AND METHOD FOR PRODUCTION OF ELECTRODE OR SOLAR BATTERY USING THE COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-01-27 | — | — | US | disclosed |
| US-20100119939-A1 | NEGATIVE ELECTRODE BASE MEMBER | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-05-13 | — | — | US | disclosed |
| EP-2131423-A1 | NEGATIVE ELECTRODE BASE MEMBER | Tokyo Ohka Kogyo Co., Ltd. (JP) | 2009-12-09 | — | — | EP | disclosed |