SCHEMBL1609561

SCHEMBL1609561

CCCCCO[SiH2]OC(CCCC)CCCC

nearest known ligand 0.38

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
DNM1 Q05193 3/20 0.38
PRKD3 O94806 1/20 0.33
PRKCG P05129 1/20 0.33
PRKCB P05771 1/20 0.33
PRKCA P17252 1/20 0.33
PRKCH P24723 1/20 0.33
PRKCI P41743 1/20 0.33
PRKCE Q02156 1/20 0.33
PRKCQ Q04759 1/20 0.33
PRKCZ Q05513 1/20 0.33
PRKCD Q05655 1/20 0.33
PRKD1 Q15139 1/20 0.33
PLA2G2C Q5R387 1/20 0.31
TSHR P16473 1/20 0.30
SMN1; SMN2 Q16637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1608615 0.89 DNM1 (0.34) DNM1TSHRSMN1; SMN2
SCHEMBL1609061 0.83 TSHR (0.32) DNM1TSHRSMN1; SMN2
SCHEMBL1326269 0.77 THRB (0.41) TSHR
SCHEMBL8769921 0.74 THRB (0.47) TSHRSMN1; SMN2
SCHEMBL28634594 0.74 THRB (0.47) TSHRSMN1; SMN2
SCHEMBL28187145 0.74 ADRB2 (0.41) TSHR
SCHEMBL30775004 0.74 THRB (0.47) TSHRSMN1; SMN2
SCHEMBL8769324 0.74 THRB (0.47) TSHRSMN1; SMN2
SCHEMBL27462289 0.74 THRB (0.47) TSHRSMN1; SMN2
SCHEMBL16497491 0.73 CTSK (0.31) DNM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 45 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9870924-B2 Diffusion agent composition, method of forming impurity diffusion layer, and solar cell TOKYO OHKA KOGYO CO., LTD. (JP) 2018-01-16 US disclosed
EP-2131423-B1 NEGATIVE ELECTRODE BASE MEMBER TOKYO OHKA KOGYO CO LTD (JP) 2017-11-15 EP disclosed
EP-2573800-B1 DIFFUSION AGENT COMPOSITION AND METHOD OF FORMING AN IMPURITY DIFFUSION LAYER TOKYO OHKA KOGYO CO LTD (JP) 2017-11-08 EP disclosed
US-9708492-B2 LED device and coating liquid used for production of same Konica Minolta, Inc. (JP) 2017-07-18 US disclosed
US-20160002526-A1 PHOSPHOR DISPERSION, LED DEVICE AND METHOD FOR MANUFACTURING SAME Konica Minolta, Inc. (JP) 2016-01-07 US disclosed
US-20150353740-A1 LED DEVICE AND COATING LIQUID USED FOR PRODUCTION OF SAME Konica Minolta, Inc. (JP) 2015-12-10 US disclosed
US-20150333233-A1 LIGHT EMITTING DEVICE Konica Minolta, Inc. (JP) 2015-11-19 US disclosed
EP-2945197-A1 LED DEVICE AND COATING LIQUID USED FOR PRODUCTION OF SAME Konica Minolta, Inc. (JP) 2015-11-18 EP disclosed
US-9190276-B2 Method of diffusing impurity-diffusing component and method of manufacturing solar cell TOKYO OHKA KOGYO CO., LTD. (JP) 2015-11-17 US disclosed
US-9184352-B2 Phosphor dispersion liquid, and production method for LED device using same Konica Minolta, Inc. (JP) 2015-11-10 US disclosed
US-8475690-B2 Diffusing agent composition, method of forming impurity diffusion layer, and solar battery TOKYO OHKA KOGYO CO., LTD. (JP) 2013-07-02 US disclosed
US-20130109123-A1 DIFFUSING AGENT COMPOSITION AND METHOD OF FORMING IMPURITY DIFFUSION LAYER TOKYO OHKA KOGYO CO., LTD. (JP) 2013-05-02 US disclosed
EP-2573800-A1 DIFFUSION AGENT COMPOSITION, METHOD OF FORMING AN IMPURITY DIFFUSION LAYER, AND SOLAR CELL Tokyo Ohka Kogyo Co., Ltd. (JP) 2013-03-27 EP disclosed
US-20130061922-A1 DIFFUSION AGENT COMPOSITION, METHOD OF FORMING IMPURITY DIFFUSION LAYER, AND SOLAR CELL TOKYO OHKA KOGYO CO., LTD. (JP) 2013-03-14 US disclosed
EP-2472655-A1 Negative electrode base member Tokyo Ohka Kogyo Co., Ltd. (JP) 2012-07-04 EP disclosed
US-20110079262-A1 DIFFUSING AGENT COMPOSITION, METHOD OF FORMING IMPURITY DIFFUSION LAYER, AND SOLAR BATTERY TOKYO OHKA KOGYO CO., LTD. (JP) 2011-04-07 US disclosed
US-20110017291-A1 DIFFUSING AGENT COMPOSITION FOR INK-JET, AND METHOD FOR PRODUCTION OF ELECTRODE OR SOLAR BATTERY USING THE COMPOSITION TOKYO OHKA KOGYO CO., LTD. (JP) 2011-01-27 US disclosed
US-20100119939-A1 NEGATIVE ELECTRODE BASE MEMBER TOKYO OHKA KOGYO CO., LTD. (JP) 2010-05-13 US disclosed
EP-2131423-A1 NEGATIVE ELECTRODE BASE MEMBER Tokyo Ohka Kogyo Co., Ltd. (JP) 2009-12-09 EP disclosed
US-20080318165-A1 Composition For Forming Antireflective Film And Wiring Forming Method Using Same TOKYO OHKA KOGYO CO., LTD. (JP) 2008-12-25 US disclosed