Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
| ▸ | CA1 | P00915 | 7/20 | 0.31 |
| ▸ | CA2 | P00918 | 7/20 | 0.31 |
| ▸ | CA9 | Q16790 | 7/20 | 0.31 |
| ▸ | THRB | P10828 | 2/20 | 0.31 |
| ▸ | CA12 | O43570 | 2/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | HTT | P42858 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
| ▸ | LPAR3 | Q9UBY5 | 6/20 | 0.30 |
| ▸ | LPAR2 | Q9HBW0 | 5/20 | 0.30 |
| ▸ | LPAR1 | Q92633 | 2/20 | 0.30 |
| ▸ | NAAA | Q02083 | 1/20 | 0.30 |
| ▸ | CA3 | P07451 | 1/20 | 0.30 |
| ▸ | CA4 | P22748 | 1/20 | 0.30 |
| ▸ | CA6 | P23280 | 1/20 | 0.30 |
| ▸ | CA5A | P35218 | 1/20 | 0.30 |
| ▸ | CA7 | P43166 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5596025 | 0.92 | DNM1 (0.39) | LMNACA1CA2CA9MEN1 | |
| SCHEMBL1608616 | 0.88 | LMNA (0.31) | LMNA | |
| SCHEMBL19809370 | 0.88 | THRB (0.35) | CA1CA2CA9THRBCA12 | |
| SCHEMBL5595926 | 0.86 | DNM1 (0.43) | LMNACA1CA2CA9CA12 | |
| SCHEMBL11349951 | 0.86 | THRB (0.40) | CA1CA2CA9THRBMEN1 | |
| SCHEMBL19809345 | 0.84 | — | — | |
| SCHEMBL28779819 | 0.84 | ADRB2 (0.35) | LMNATSHR | |
| SCHEMBL19809194 | 0.84 | CA1 (0.32) | CA1CA2CA9THRBCA12 | |
| SCHEMBL19809168 | 0.84 | NR5A1 (0.32) | CA1CA2CA9THRBCA12 | |
| SCHEMBL17216628 | 0.83 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 55 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114437263-A | Low-VOC low-odor polypropylene resin and preparation method and application thereof | 中国石油化工股份有限公司 | 2022-05-06 | — | — | CN | claimed |
| CN-114716591-A | Catalyst component for propylene polymerization, preparation method and application thereof | 任丘市利和科技发展有限公司 | 2022-07-08 | — | — | CN | disclosed |
| CN-109111535-B | Catalyst component for olefin polymerization and catalyst thereof | 中国石油化工股份有限公司 | 2021-03-16 | — | — | CN | disclosed |
| CN-109111536-B | Catalyst component for olefin polymerization and catalyst thereof | 中国石油化工股份有限公司 | 2021-03-16 | — | — | CN | disclosed |
| CN-109111537-B | Catalyst component for olefin polymerization and catalyst thereof | 中国石油化工股份有限公司 | 2021-03-16 | — | — | CN | disclosed |
| CN-109111538-B | Catalyst component for olefin polymerization and catalyst thereof | 中国石油化工股份有限公司 | 2021-02-05 | — | — | CN | disclosed |
| CN-109111539-B | Catalyst component for olefin polymerization and catalyst thereof | 中国石油化工股份有限公司 | 2021-02-05 | — | — | CN | disclosed |
| CN-107075119-B | Method for producing siloxane resin | 株式会社钟化 | 2021-01-05 | — | — | CN | disclosed |
| US-9870924-B2 | Diffusion agent composition, method of forming impurity diffusion layer, and solar cell | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-01-16 | — | — | US | disclosed |
| EP-2131423-B1 | NEGATIVE ELECTRODE BASE MEMBER | TOKYO OHKA KOGYO CO LTD (JP) | 2017-11-15 | — | — | EP | disclosed |
| EP-2573800-A1 | DIFFUSION AGENT COMPOSITION, METHOD OF FORMING AN IMPURITY DIFFUSION LAYER, AND SOLAR CELL | Tokyo Ohka Kogyo Co., Ltd. (JP) | 2013-03-27 | — | — | EP | disclosed |
| US-20130061922-A1 | DIFFUSION AGENT COMPOSITION, METHOD OF FORMING IMPURITY DIFFUSION LAYER, AND SOLAR CELL | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-03-14 | — | — | US | disclosed |
| EP-2472655-A1 | Negative electrode base member | Tokyo Ohka Kogyo Co., Ltd. (JP) | 2012-07-04 | — | — | EP | disclosed |
| US-20110079262-A1 | DIFFUSING AGENT COMPOSITION, METHOD OF FORMING IMPURITY DIFFUSION LAYER, AND SOLAR BATTERY | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-04-07 | — | — | US | disclosed |
| US-20110017291-A1 | DIFFUSING AGENT COMPOSITION FOR INK-JET, AND METHOD FOR PRODUCTION OF ELECTRODE OR SOLAR BATTERY USING THE COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-01-27 | — | — | US | disclosed |
| CN-101010635-B | Composition for forming antireflective film and wiring forming method using same | TOKYO OHKA KOGYO CO LTD | 2010-06-16 | — | — | CN | disclosed |
| US-20100119939-A1 | NEGATIVE ELECTRODE BASE MEMBER | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-05-13 | — | — | US | disclosed |
| EP-2131423-A1 | NEGATIVE ELECTRODE BASE MEMBER | Tokyo Ohka Kogyo Co., Ltd. (JP) | 2009-12-09 | — | — | EP | disclosed |
| US-20080318165-A1 | Composition For Forming Antireflective Film And Wiring Forming Method Using Same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-12-25 | — | — | US | disclosed |
| CN-101010635-A | Composition for forming antireflective film and wiring forming method using same | TOKYO OHKA KOGYO CO LTD (JP) | 2007-08-01 | — | — | CN | disclosed |