Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.37 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.36 |
| ▸ | AKT1 | P31749 | 5/20 | 0.36 |
| ▸ | AKT2 | P31751 | 5/20 | 0.36 |
| ▸ | PDE10A | Q9Y233 | 1/20 | 0.35 |
| ▸ | GAA | P10253 | 4/20 | 0.33 |
| ▸ | MAPT | P10636 | 3/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
| ▸ | PKM | P14618 | 1/20 | 0.33 |
| ▸ | RAB9A | P51151 | 1/20 | 0.33 |
| ▸ | ADORA1 | P30542 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | MGAM | O43451 | 2/20 | 0.31 |
| ▸ | SI | P14410 | 2/20 | 0.31 |
| ▸ | MGAM2 | Q2M2H8 | 2/20 | 0.31 |
| ▸ | TP53 | P04637 | 1/20 | 0.31 |
| ▸ | BCHE | P06276 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30343795 | 0.84 | AKT1 (0.36) | ALDH1A1KDM4EL3MBTL1TDP1AKT1 | |
| SCHEMBL309105 | 0.84 | AKT1 (0.36) | ALDH1A1KDM4EL3MBTL1TDP1AKT1 | |
| SCHEMBL13707049 | 0.80 | HSD11B1 (0.38) | L3MBTL1AKT1AKT2PDE10AMAPT | |
| SCHEMBL1869867 | 0.80 | BCHE (0.32) | TDP1AKT1AKT2PDE10ABCHE | |
| SCHEMBL17133349 | 0.80 | BCHE (0.36) | ALDH1A1KDM4EL3MBTL1TDP1AKT1 | |
| SCHEMBL476565 | 0.79 | HSD11B1 (0.42) | ALDH1A1KDM4EL3MBTL1GAASMN1; SMN2 | |
| SCHEMBL29389827 | 0.79 | HSD11B1 (0.42) | ALDH1A1KDM4EL3MBTL1GAASMN1; SMN2 | |
| SCHEMBL1864926 | 0.78 | AKT1 (0.35) | ALDH1A1KDM4EL3MBTL1TDP1AKT1 | |
| SCHEMBL15926080 | 0.78 | AKT1 (0.34) | KDM4EAKT1AKT2PDE10APKM | |
| SCHEMBL1865434 | 0.77 | FABP4 (0.35) | ALDH1A1KDM4EL3MBTL1TDP1AKT1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 50 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2023054619-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, PRINTED CIRCUIT BOARD, AND METHOD FOR PRODUCING PRINTED CIRCUIT BOARD | 太陽インキ製造株式会社 | 2023-04-06 | — | — | WO | disclosed |
| US-10272426-B2 | Method of producing microfluidic device, microfluidic device, and photosensitive resin composition | JSR CORPORATION (JP) | 2019-04-30 | — | — | US | disclosed |
| US-10095110-B2 | Photosensitive resin composition, method for forming resist pattern, and method for producing metallic pattern | JSR CORPORATION (JP) | 2018-10-09 | — | — | US | disclosed |
| EP-1999514-B1 | PHOTOSENSITIVE RESIST COMPOSITION FOR COLOR FILTERS FOR USE IN ELECTRONIC PAPER DISPLAY DEVICES | CIBA HOLDING INC (CH) | 2018-10-03 | — | — | EP | disclosed |
| US-9784965-B2 | Display element, photosensitive composition and electrowetting display | JSR CORPORATION (JP) | 2017-10-10 | — | — | US | disclosed |
| US-9753274-B2 | Display element, photosensitive composition and electrowetting display | JSR CORPORATION (JP) | 2017-09-05 | — | — | US | disclosed |
| US-20170153543-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING METALLIC PATTERN | JSR CORPORATION (JP) | 2017-06-01 | — | — | US | disclosed |
| US-20170127533-A1 | PRODUCTION PROCESS FOR SOLDER ELECTRODE, PRODUCTION PROCESS FOR LAMINATE, LAMINATE AND ELECTRONIC PART | JSR CORPORATION (JP) | 2017-05-04 | — | — | US | disclosed |
| US-9625706-B2 | Display element, photosensitive composition and electrowetting display | JSR CORPORATION (JP) | 2017-04-18 | — | — | US | disclosed |
| US-20160310944-A1 | METHOD OF PRODUCING MICROFLUIDIC DEVICE, MICROFLUIDIC DEVICE, AND PHOTOSENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2016-10-27 | — | — | US | disclosed |
| US-6120973-A | PHOTOSENSITIVE COMPOSITION AND COLORS WITH POLYMERS | JSR CORPORATION (JP) | 2000-09-19 | — | — | US | disclosed |
| EP-1033626-A1 | Radiation sensitive composition | JSR Corporation (JP) | 2000-09-06 | — | — | EP | disclosed |
| EP-1033625-A1 | Radiation sensitive composition | JSR Corporation (JP) | 2000-09-06 | — | — | EP | disclosed |
| US-6087050-A | Radiation sensitive composition and color filter | JSR CORPORATION (JP) | 2000-07-11 | — | — | US | disclosed |
| US-6013415-A | Radiation sensitive composition | JSR CORPORATION (JP) | 2000-01-11 | — | — | US | disclosed |
| EP-0902327-A2 | Radiation sensitive composition | JSR Corporation (JP) | 1999-03-17 | — | — | EP | disclosed |
| EP-0893737-A2 | Radiation sensitive composition | JSR Corporation (JP) | 1999-01-27 | — | — | EP | disclosed |
| EP-0881541-A1 | Radiation sensitive composition and color filter | JSR Corporation (JP) | 1998-12-02 | — | — | EP | disclosed |
| EP-0875788-A1 | Radiation sensitive composition for color filters | JSR Corporation (JP) | 1998-11-04 | — | — | EP | disclosed |
| EP-0866367-A2 | Radiation sensitive composition | JSR Corporation (JP) | 1998-09-23 | — | — | EP | disclosed |