SCHEMBL309105

SCHEMBL309105

Cc1ccccc1-c1nc(-c2ccccc2)c(-c2ccccc2)n1C1(c2ccccc2C)N=C(c2ccccc2)C(c2ccccc2)=N1

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
AKT1 P31749 4/20 0.36
AKT2 P31751 4/20 0.36
PDE10A Q9Y233 1/20 0.35
BCHE P06276 1/20 0.33
ACHE P22303 1/20 0.33
DPP4 P27487 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
ALDH1A1 P00352 2/20 0.32
ADORA2A P29274 1/20 0.32
KDM4E B2RXH2 1/20 0.32
LMNA P02545 1/20 0.32
GAA P10253 1/20 0.32
FABP4 P15090 2/20 0.32
FABP5 Q01469 1/20 0.32
NPC1 O15118 1/20 0.31
HPGD P15428 1/20 0.31
TSHR P16473 1/20 0.31
RAB9A P51151 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30343795 1.00 AKT1 (0.36) AKT1AKT2PDE10ABCHEACHE
SCHEMBL15926080 0.91 AKT1 (0.34) AKT1AKT2PDE10ABCHEACHE
SCHEMBL13707049 0.91 HSD11B1 (0.38) AKT1AKT2PDE10ALMNAHPGD
SCHEMBL17133349 0.89 BCHE (0.36) AKT1AKT2PDE10ABCHEACHE
SCHEMBL1865434 0.86 FABP4 (0.35) AKT1AKT2PDE10ABCHEACHE
SCHEMBL1865943 0.84 AKT1 (0.41) AKT1AKT2ALDH1A1KDM4ELMNA
SCHEMBL1870295 0.84 FABP4 (0.35) AKT1AKT2TDP1LMNAFABP4
SCHEMBL1614534 0.84 ALDH1A1 (0.37) AKT1AKT2PDE10ABCHEACHE
SCHEMBL1871895 0.83 AKT1 (0.43) AKT1AKT2PDE10AALDH1A1KDM4E
SCHEMBL4452418 0.82 AKT1 (0.35) AKT1AKT2BCHEACHEDPP4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 62 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240317942-A1 THIOL-CONTAINING COMPOSITION, PHOTOSETTING COMPOSITION, AND THERMOSETTING COMPOSITION RESONAC CORPORATION (JP) 2024-09-26 US disclosed
EP-4375302-A1 THIOL-CONTAINING COMPOSITION, PHOTOCURABLE COMPOSITION, AND THERMOSETTING COMPOSITION Resonac Corporation (JP) 2024-05-29 EP disclosed
WO-2023003011-A1 THIOL-CONTAINING COMPOSITION, PHOTOCURABLE COMPOSITION, AND THERMOSETTING COMPOSITION 昭和電工株式会社 2023-01-26 WO disclosed
EP-2154162-B1 REACTIVE URETHANE COMPOUND HAVING ETHER BOND, CURABLE COMPOSITION AND CURED MATERIAL SHOWA DENKO KK (JP) 2019-07-17 EP disclosed
US-10272426-B2 Method of producing microfluidic device, microfluidic device, and photosensitive resin composition JSR CORPORATION (JP) 2019-04-30 US disclosed
US-10095110-B2 Photosensitive resin composition, method for forming resist pattern, and method for producing metallic pattern JSR CORPORATION (JP) 2018-10-09 US disclosed
EP-3085661-B1 METHOD OF PRODUCING MICROFLUIDIC DEVICE JSR CORP (JP) 2017-12-27 EP disclosed
US-9784965-B2 Display element, photosensitive composition and electrowetting display JSR CORPORATION (JP) 2017-10-10 US disclosed
US-9753274-B2 Display element, photosensitive composition and electrowetting display JSR CORPORATION (JP) 2017-09-05 US disclosed
US-20170153543-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING METALLIC PATTERN JSR CORPORATION (JP) 2017-06-01 US disclosed
US-6368774-B1 MIXTURE CONTAINING ISOINDOLININE DYE JSR CORPORATION (JP) 2002-04-09 US disclosed
US-6348298-B1 COMPOSITION CONSISTING OF COLORANT CONTAINING PHTHALOCYANINE BLUE AND PHTHALOCYANINE GREEN OR PIGMENT GREEN 36, ALKALI-SOLUBLE RESIN, POLYFUNCTIONAL MONOMER, AND PHOTOPOLYMERIZATION INITIATOR JSR CORPORATION (JP) 2002-02-19 US disclosed
US-6251571-B1 MIXTURE OF OXIDIZER, DYE AND HYDROXYLAMINE E. I. DU PONT DE NEMOURS AND COMPANY 2001-06-26 US disclosed
US-6140019-A Radiation sensitive composition JSR CORPORATION (JP) 2000-10-31 US disclosed
EP-1033625-A1 Radiation sensitive composition JSR Corporation (JP) 2000-09-06 EP disclosed
EP-1033626-A1 Radiation sensitive composition JSR Corporation (JP) 2000-09-06 EP disclosed
EP-1031579-A2 Photopolymerization initiator for color filter, photosensitive coloring composition, and color filter SHOWA DENKO KABUSHIKI KAISHA (JP) 2000-08-30 EP disclosed
US-6013415-A Radiation sensitive composition JSR CORPORATION (JP) 2000-01-11 US disclosed
EP-0941866-A1 Non-photosensitive, thermally imageable element having improved room light stability E. I. du Pont de Nemours and Company (US) 1999-09-15 EP disclosed
EP-0893737-A2 Radiation sensitive composition JSR Corporation (JP) 1999-01-27 EP disclosed