SCHEMBL476565

SCHEMBL476565

Clc1ccc(-c2nc(-c3ccccc3)c(-c3ccccc3)n2C2(c3ccc(Cl)cc3Cl)N=C(c3ccccc3)C(c3ccccc3)=N2)c(Cl)c1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 1/20 0.42
KDM4E B2RXH2 3/20 0.38
MAPK1 P28482 1/20 0.38
DPP4 P27487 5/20 0.37
CYP3A4 P08684 4/20 0.37
NPSR1 Q6W5P4 2/20 0.36
NPC1 O15118 1/20 0.36
ALDH1A1 P00352 1/20 0.36
TP53 P04637 1/20 0.36
HPGD P15428 1/20 0.36
TSHR P16473 1/20 0.36
RAB9A P51151 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
HSD17B10 Q99714 1/20 0.36
CYP2C19 P33261 3/20 0.35
LMNA P02545 2/20 0.35
CYP2C9 P11712 2/20 0.35
GAA P10253 1/20 0.35
L3MBTL1 Q9Y468 1/20 0.35
CYP1A2 P05177 2/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29389827 1.00 HSD11B1 (0.42) HSD11B1KDM4EMAPK1DPP4CYP3A4
SCHEMBL10672501 0.87 L3MBTL1 (0.39) KDM4EMAPK1NPSR1ALDH1A1LMNA
SCHEMBL1869270 0.86 MGAM (0.38) KDM4EMAPK1NPC1ALDH1A1TSHR
SCHEMBL29749791 0.84 HSD11B1 (0.37) HSD11B1KDM4EDPP4NPC1ALDH1A1
SCHEMBL307038 0.84 HSD11B1 (0.37) HSD11B1KDM4EDPP4NPC1ALDH1A1
SCHEMBL29359500 0.84 HSD11B1 (0.37) HSD11B1KDM4EDPP4NPC1ALDH1A1
SCHEMBL1868574 0.83 MGAM (0.42) DPP4NPC1TSHRRAB9ASMN1; SMN2
SCHEMBL6693283 0.82 GAA (0.33) KDM4ELMNAGAAL3MBTL1PKM
SCHEMBL29892510 0.81 MAPT (0.48) KDM4EDPP4NPSR1NPC1TSHR
SCHEMBL1079566 0.81 MAPT (0.48) KDM4EDPP4NPSR1NPC1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 393 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20180031912-A1 METHODS OF FABRICATING QUANTUM DOT COLOR FILM SUBSTRATES SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO. 2018-02-01 US claimed
US-7932300-B2 Energy beam curable type ink jet printing ink JSR CORPORATION (JP) 2011-04-26 US claimed
US-6087050-A Radiation sensitive composition and color filter JSR CORPORATION (JP) 2000-07-11 US claimed
EP-0902327-A2 Radiation sensitive composition JSR Corporation (JP) 1999-03-17 EP claimed
EP-0881541-A1 Radiation sensitive composition and color filter JSR Corporation (JP) 1998-12-02 EP claimed
EP-0875788-A1 Radiation sensitive composition for color filters JSR Corporation (JP) 1998-11-04 EP claimed
JP-11043522-A None JP disclosed
WO-2026100726-A1 DECORATIVE FILM, ELECTRONIC MEMBER, AND TOUCH PAD JSR株式会社 2026-05-15 WO disclosed
US-12577432-B2 Organosilicon compound, production method therefor, and curable composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-03-17 US disclosed
EP-4282653-B1 ORGANOSILICON COMPOUND, PRODUCTION METHOD THEREFOR, AND CURABLE COMPOSITION SHINETSU CHEMICAL CO (JP) 2026-02-25 EP disclosed
US-12522684-B2 Active-energy-ray-curable resin composition and cured product thereof NIPPON SHOKUBAI CO., LTD. (JP) 2026-01-13 US disclosed
EP-4159779-B1 ACTIVE-ENERGY-RAY-CURABLE RESIN COMPOSITION AND CURED PRODUCT THEREOF NIPPON CATALYTIC CHEM IND (JP) 2025-12-10 EP disclosed
US-12281235-B2 Photocurable composition, inkjet ink composition, active energy ray-curable ink composition, cured product, and electronic component JNC CORPORATION (JP) 2025-04-22 US disclosed
EP-0902327-A2 Radiation sensitive composition JSR Corporation (JP) 1999-03-17 EP disclosed
JP-H1143522-A FLUOPHOR-DISPERSED, RAY-SENSITIVE COMPOSITION JSR CORP 1999-02-16 JP disclosed
EP-0893737-A2 Radiation sensitive composition JSR Corporation (JP) 1999-01-27 EP disclosed
EP-0881541-A1 Radiation sensitive composition and color filter JSR Corporation (JP) 1998-12-02 EP disclosed
EP-0875788-A1 Radiation sensitive composition for color filters JSR Corporation (JP) 1998-11-04 EP disclosed
EP-0866367-A2 Radiation sensitive composition JSR Corporation (JP) 1998-09-23 EP disclosed
US-4749796-A PHOTORESISTS HODOGAYA CHEMICAL CO., LTD. (JP) 1988-06-07 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12577432-B2 Organosilicon compound, production method therefor, and curable composition ASH2L, DOT1L, DNMT3L HSD11B1 159/4885KDM4E 319/4885MAPK1 2998/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.