SCHEMBL1614828

SCHEMBL1614828

[O-][S+]1c2ccccc2Cc2cc(-c3ccccc3)ccc21

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP2 O95551 1/20 0.38
PARP10 Q53GL7 1/20 0.34
PARP11 Q9NR21 1/20 0.34
KDM1A O60341 2/20 0.33
KDM4E B2RXH2 2/20 0.33
MEN1 O00255 2/20 0.33
GAA P10253 2/20 0.33
MAPT P10636 2/20 0.33
KMT2A Q03164 2/20 0.33
ALOX5 P09917 1/20 0.33
KDM1B Q8NB78 1/20 0.33
NPC1 O15118 1/20 0.33
RXFP1 Q9HBX9 1/20 0.33
HSD17B3 P37058 1/20 0.33
TYRO3 Q06418 2/20 0.33
NTRK2 Q16620 2/20 0.33
CLK4 Q9HAZ1 2/20 0.33
DYRK1B Q9Y463 2/20 0.33
MMP12 P39900 1/20 0.32
MMP13 P45452 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6070528 0.85 CYP1A2 (0.42) TDP2KDM4EMEN1KMT2ARXFP1
SCHEMBL10476775 0.81 MAOA (0.39) KDM4EMAPTNPC1CLK4DYRK1B
SCHEMBL36333 0.81 MAOA (0.39) KDM4EMAPTNPC1CLK4DYRK1B
SCHEMBL9160477 0.81 MAOA (0.39) KDM4EMAPTNPC1CLK4DYRK1B
Ammonia Solution, Strong SCHEMBL1871983 0.79 MAOA (0.37) KDM4EMAPTNPC1CLK4DYRK1B
Hydrochloric Acid SCHEMBL585839 0.79 MAOA (0.37) KDM4EMAPTNPC1CLK4DYRK1B
SCHEMBL11516655 0.77 CA1 (0.33) HSD17B3ALDH1A1HPGDHTT
SCHEMBL82772 0.77 ALDH1A1 (0.34) KDM4EMEN1GAAMAPTKMT2A
SCHEMBL15411118 0.77 ALDH1A1 (0.34) KDM4EMEN1GAAMAPTKMT2A
SCHEMBL44048 0.77 DRD1 (0.44) MEN1KMT2AALDH1A1ESR2LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 63 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2820073-B1 GLOSS-CONTROLLABLE, RADIATION-CURABLE INKJET INK ELECTRONICS FOR IMAGING INC (US) 2018-09-05 EP claimed
US-9260616-B2 Gloss-controllable, radiation-curable inkjet ink ELECTRONICS FOR IMAGING, INC. (US) 2016-02-16 US claimed
EP-2820073-A1 GLOSS-CONTROLLABLE, RADIATION-CURABLE INKJET INK Electronics for Imaging, Inc. (US) 2015-01-07 EP claimed
WO-2013130618-A1 GLOSS-CONTROLLABLE, RADIATION-CURABLE INKJET INK ELECTRONICS FOR IMAGING, INC. (US) 2013-09-06 WO claimed
US-20130222499-A1 GLOSS-CONTROLLABLE, RADIATION-CURABLE INKJET INK GLAS USA LLC [SUCCESSOR COLLATERAL AGENT] 2013-08-29 US claimed
CN-119654387-A Window film 琳得科株式会社 2025-03-18 CN disclosed
CN-119596642-A Curable composition, film forming method and manufacturing method 佳能株式会社 2025-03-11 CN disclosed
CN-118742617-A Window film 琳得科株式会社 2024-10-01 CN disclosed
EP-4186704-B1 PLANARIZATION LAYER, PLANARIZING METHOD, AND SEMICONDUCTOR CHIP FUNAI ELECTRIC CO (JP) 2024-05-08 EP disclosed
EP-3464491-B1 LOW ODOR RADIATION CURABLE INK COMPOSITIONS ELECTRONICS FOR IMAGING INC (US) 2024-05-01 EP disclosed
US-11815812-B2 Photoresist formulation FUNAI ELECTRIC CO., LTD. 2023-11-14 US disclosed
CN-116893571-A Photosensitive composition 东京应化工业株式会社 2023-10-17 CN disclosed
EP-0237004-B1 A crystalline aromatic polyketone copolymer and a process for producing the same ASAHI CHEMICAL IND (JP) 1993-12-22 EP disclosed
US-4804735-A NONFLAMMABLE MOLDING MATERIALS ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1989-02-14 US disclosed
US-4772679-A CONTAINING SULFIDE LINKAGE, HEAT RESISTANCE ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1988-09-20 US disclosed
EP-0237004-A2 A crystalline aromatic polyketone copolymer and a process for producing the same Asahi Kasei Kogyo Kabushiki Kaisha (JP) 1987-09-16 EP disclosed
EP-0185317-A2 Crystalline aromatic polyketone and process for producing the same Asahi Kasei Kogyo Kabushiki Kaisha (JP) 1986-06-25 EP disclosed
EP-0058909-B1 RADIATION-CURABLE ORGANOPOLYSILOXANE COMPOSITIONS, AND THEIR USE IN MAKING RELEASE COMPOSITIONS Herberts Gesellschaft mit beschränkter Haftung (DE) 1984-11-07 EP disclosed
EP-0058909-A1 Radiation-curable organopolysiloxane compositions, and their use in making release compositions Herberts Gesellschaft mit beschränkter Haftung (DE) 1982-09-01 EP disclosed
US-4268659-A ESTERIFICATION WITH ACRYLIC OR METHACRYLIC ESTERS CONTAINING AN OXIRANE RING HERBERTS GESELLSCHAFT MIT BESCHRANKTER HAFTUNG (DE) 1981-05-19 US disclosed