SCHEMBL1614837

SCHEMBL1614837

CC(C)Oc1ccc(Cl)c2c1[S+]([O-])c1ccccc1C2

nearest known ligand 0.32

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
S1PR1 P21453 3/20 0.32
S1PR3 Q99500 1/20 0.32
CSNK2A1 P68400 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8065205 0.82 HTT (0.34)
SCHEMBL942206 0.81
SCHEMBL3014685 0.80
SCHEMBL133173 0.80 CSNK2A1 (0.35) CSNK2A1
SCHEMBL8080081 0.80 KDM4E (0.37)
SCHEMBL1615143 0.78 NPC1 (0.38)
SCHEMBL3159501 0.77 S1PR5 (0.36)
SCHEMBL1615176 0.77 S1PR5 (0.36)
SCHEMBL8074840 0.77 ADRA2A (0.45)
SCHEMBL84111 0.76 MEN1 (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2192163-B1 Ink composition and inkjet recording method FUJIFILM CORP (JP) 2017-04-19 EP disclosed
CN-104220537-A Printing ink, apparatus and method SERICOL LTD 2014-12-17 CN disclosed
US-8557889-B2 Ink composition and inkjet recording method FUJIFILM CORPORATION (JP) 2013-10-15 US disclosed
US-20110086314-A1 MELTS ROHM AND HAAS ELECTRONIC MATERIAL LLC (US) 2011-04-14 US disclosed
EP-2192163-A1 Ink composition and inkjet recording method Fujifilm Corporation (JP) 2010-06-02 EP disclosed
US-20100129565-A1 INK COMPOSITION AND INKJET RECORDING METHOD FUJIFILM CORPORATION (JP) 2010-05-27 US disclosed
US-20090214980-A1 Melts ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2009-08-27 US disclosed
CN-1829818-A Process for the production of strongly adherent coatings CIBA SC HOLDING AG (CH) 2006-09-06 CN disclosed
US-20060121389-A1 Melts ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2006-06-08 US disclosed
EP-1630600-A2 Hot melt composition and method involving forming a masking pattern Rohm and Haas Electronic Materials, L.L.C. (US) 2006-03-01 EP disclosed
EP-0520574-B1 Thioxanthone derivatives LAMBSON FINE CHEMICALS LIMITED (GB) 2000-08-16 EP disclosed
US-5414092-A Photoinitiators INTERNATIONAL BIO-SYNTHETICS LIMITED (GB) 1995-05-09 US disclosed
EP-0520574-A1 Thioxanthone derivatives GREAT LAKES FINE CHEMICALS LIMITED (GB) 1992-12-30 EP disclosed