SCHEMBL1618302

SCHEMBL1618302

CCCCOc1cc(N(C)C)ccc1C(=O)O

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 2/20 0.47
NPC1 O15118 1/20 0.47
ALDH1A1 P00352 1/20 0.47
MAPT P10636 1/20 0.47
HPGD P15428 1/20 0.47
MAPK1 P28482 1/20 0.47
RAB9A P51151 1/20 0.47
MCL1 Q07820 1/20 0.47
SMN1; SMN2 Q16637 1/20 0.47
PTPN11 Q06124 5/20 0.46
S1PR3 Q99500 1/20 0.46
PPARG P37231 1/20 0.46
PPARA Q07869 1/20 0.46
RARA P10276 1/20 0.44
RARB P10826 1/20 0.44
RXRA P19793 1/20 0.44
KEAP1 Q14145 1/20 0.44
NFE2L2 Q16236 1/20 0.44
PTPN1 P18031 1/20 0.43
PTPN6 P29350 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7484904 0.88 KDM4E (0.55) KDM4EALDH1A1MAPTSMN1; SMN2PTPN11
SCHEMBL1830431 0.84 RAB9A (0.47) KDM4ENPC1ALDH1A1MAPTHPGD
SCHEMBL4304889 0.81 PPARG (0.55) KDM4ESMN1; SMN2PTPN11S1PR3PPARG
SCHEMBL1750042 0.81 PTPN11 (0.57) KDM4EALDH1A1MCL1PTPN11PPARG
SCHEMBL13206046 0.80 ACLY (0.48) PTPN11RARARARBPTPN1TP53
SCHEMBL11776705 0.80 TSHR (0.55) KDM4EALDH1A1SMN1; SMN2PTPN11S1PR3
SCHEMBL8243911 0.80 ESR1 (0.50) NPC1ALDH1A1MAPTMAPK1RAB9A
SCHEMBL10624476 0.80 PTPN11 (0.63) ALDH1A1HPGDPTPN11RARBTSHR
SCHEMBL308244 0.79 RARB (0.45) KDM4ENPC1ALDH1A1MAPTHPGD
SCHEMBL27908567 0.79 LMNA (0.59) KDM4ENPC1ALDH1A1MAPTHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10192650-B2 Photosensitive conductive paste, method of producing multilayer electronic component using the same, and multilayer electronic component MURATA MANUFACTURING CO., LTD. (JP) 2019-01-29 US claimed
US-20170236611-A1 PHOTOSENSITIVE CONDUCTIVE PASTE, METHOD OF PRODUCING MULTILAYER ELECTRONIC COMPONENT USING THE SAME, AND MULTILAYER ELECTRONIC COMPONENT MURATA MANUFACTURING CO., LTD. (JP) 2017-08-17 US claimed
EP-2370525-B1 A SOLVENTLESS ANTIMICROBIAL UV CURABLE COATING COMPOSITIONS BECTON DICKINSON CO (US) 2017-01-25 EP claimed
US-20250236719-A1 RESIN COMPOSITION MURATA MANUFACTURING CO., LTD. (JP) 2025-07-24 US disclosed
US-20240177911-A1 PHOTOSENSITIVE CONDUCTIVE PASTE, METHOD FOR PRODUCING MULTILAYER ELECTRONIC COMPONENT, AND MULTILAYER ELECTRONIC COMPONENT MURATA MANUFACTURING CO., LTD. (JP) 2024-05-30 US disclosed
CN-118073002-A Photosensitive conductive paste, method for producing laminated electronic component, and laminated electronic component 株式会社村田制作所 2024-05-24 CN disclosed
US-20240085787-A1 PHOTOSENSITIVE PASTE, METHOD FOR FORMING WIRING PATTERN, METHOD FOR PRODUCING ELECTRONIC COMPONENT, AND ELECTRONIC COMPONENT MURATA MANUFACTURING CO., LTD. (JP) 2024-03-14 US disclosed
CN-117631452-A Photosensitive paste, wiring pattern forming method, electronic component manufacturing method, and electronic component 株式会社村田制作所 2024-03-01 CN disclosed
CN-109416508-B Photosensitive conductive paste, method for producing laminated electronic component, and laminated electronic component 株式会社村田制作所 2022-03-15 CN disclosed
CN-106940514-B Photosensitive resin composition and photosensitive paste using same 株式会社村田制作所 2021-10-08 CN disclosed
CN-109565941-B Ceramic electronic component 株式会社村田制作所 2021-07-20 CN disclosed
US-20030036020-A1 Photosensitive conductive paste, method for forming conductive pattern using the same, and method for manufacturing ceramic multilayer element MURATA MANUFACTURING CO., LTD. (JP) 2003-02-20 US disclosed
US-20020106577-A1 Photosensitive copper paste and method of forming copper pattern using the same MURATA MANUFACTURING CO., LTD. 2002-08-08 US disclosed
US-20020076657-A1 Method for forming thick film pattern and photosensitive paste used therefor MURATA MANUFACTURING CO., LTD. 2002-06-20 US disclosed
US-6399282-B1 Method for forming conductive pattern and producing ceramic multi-layer substrate MURATA MANUFACTURING CO., LTD. (JP) 2002-06-04 US disclosed
US-6346564-B1 PASTE COMPRISING MIXTURE OF ORGANIC BINDER HAVING ACIDIC FUNCTIONAL GROUP, AT LEAST ONE POLYVALENT METAL OR POLYVALENT METALLIC COMPOUND, ANION-ADSORPTIVE SUBSTANCE WHICH ADSORBS ANION OF BINDER MURATA MANUFACTURING CO., LTD. (JP) 2002-02-12 US disclosed
US-6315927-B1 USED FOR FORMING WIRING PATTERN OF A HIGH-FREQUENCY ELECTRONIC COMPONENT; STORAGE STABILITY MURATA MANUFACTURING CO., LTD. (JP) 2001-11-13 US disclosed
US-20010033219-A1 Photosensitive thick film composition and electronic device using the same MURATA MANUFACTURING CO., LTD. 2001-10-25 US disclosed
US-6183669-B1 Paste composition, circuit board using the same, ceramic green sheet, ceramic substrate, and method for manufacturing ceramic multilayer substrate MURATA MANUFACTURING CO., LTD. (JP) 2001-02-06 US disclosed
US-6156237-A Conductive paste and circuit substrate formed by use of the paste MURATA MANUFACTURING CO., LTD. (JP) 2000-12-05 US disclosed