Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 19/20 | 0.41 |
| ▸ | CA2 | P00918 | 19/20 | 0.41 |
| ▸ | MMP1 | P03956 | 4/20 | 0.39 |
| ▸ | MMP2 | P08253 | 4/20 | 0.39 |
| ▸ | MMP9 | P14780 | 4/20 | 0.39 |
| ▸ | MMP8 | P22894 | 4/20 | 0.39 |
| ▸ | MMP13 | P45452 | 4/20 | 0.39 |
| ▸ | THRB | P10828 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1618321 | 0.91 | CA1 (0.43) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL1618772 | 0.86 | CA1 (0.44) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL1618140 | 0.85 | CA1 (0.47) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL1618330 | 0.80 | CA1 (0.37) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL27241367 | 0.79 | CA1 (0.41) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL13455184 | 0.79 | CA2 (0.55) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL17577416 | 0.78 | CA1 (0.36) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL1618706 | 0.77 | CA2 (0.47) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL319638 | 0.77 | CA2 (0.48) | CA1CA2MMP1MMP2MMP9 | |
| SCHEMBL22503262 | 0.76 | CA1 (0.42) | CA1CA2MMP1MMP2MMP9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10175578-B2 | Pattern forming method, composition for forming protective film, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2019-01-08 | — | — | US | disclosed |
| US-20180011406-A1 | PATTERN FORMING METHOD, RESIST PATTERN, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND COMPOSITION FOR FORMING UPPER LAYER FILM | FUJIFILM CORPORATION (JP) | 2018-01-11 | — | — | US | disclosed |
| US-20170349686-A1 | PATTERN FORMING METHOD, RESIST PATTERN, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2017-12-07 | — | — | US | disclosed |
| US-20170351179-A1 | COMPOSITION FOR FORMING UPPER LAYER FILM, PATTERN FORMING METHOD USING THE SAME, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2017-12-07 | — | — | US | disclosed |
| US-20170285482-A1 | ORGANIC PROCESSING LIQUID AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2017-10-05 | — | — | US | disclosed |
| US-20170199461-A1 | PATTERN FORMING METHOD, RESIST PATTERN, AND PROCESS FOR PRODUCING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2017-07-13 | — | — | US | disclosed |
| US-20170199460-A1 | PATTERN FORMING METHOD, RESIST PATTERN, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2017-07-13 | — | — | US | disclosed |
| US-20170199460-A1 | PATTERN FORMING METHOD, RESIST PATTERN, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2017-07-13 | — | — | US | disclosed |
| US-20170199461-A1 | PATTERN FORMING METHOD, RESIST PATTERN, AND PROCESS FOR PRODUCING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2017-07-13 | — | — | US | disclosed |
| US-20170184970-A1 | PATTERN FORMING METHOD, COMPOSITION FOR FORMING UPPER LAYER FILM, RESIST PATTERN, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2017-06-29 | — | — | US | disclosed |
| EP-1414088-B1 | NOVEL ONIUM SALT, ELECTROLYTE FOR NONAQUEOUS CELL CONTAINING THE NOVEL ONIUM SALT FOR NONAQUEOUS CELL, AND METHOD FOR OPTIMIZING A NEGATIVE ELECTRODE USING AN ELECTROLYTE CONTAINING THE ONIUM SALT | TOKUYAMA CORP (JP) | 2013-05-22 | — | — | EP | disclosed |
| US-7960554-B2 | Ambient-temperature molten salts and process for producing the same | TOYOTA JIDOSHA KABUSHIKI KAISHA (JP) | 2011-06-14 | — | — | US | disclosed |
| US-7923142-B2 | Onium salt, electrolyte for nonaqueous cell containing the novel onium salt for nonaqueous cell and method for optimizing negative electrode using electrolyte containing onium salt | TOKUYAMA CORPORATION (JP) | 2011-04-12 | — | — | US | disclosed |
| US-7846576-B2 | Onium salt, electrolyte for non-aqueous cell containing the novel onium salt for nonaqueous cell, and method for optimizing negative electrode using elecrolyte containing onium salt | TOKUYAMA CORPORATION (JP) | 2010-12-07 | — | — | US | disclosed |
| US-7534509-B2 | Ambient-temperature molten salts and process for producing the same | TOYOTA JIDOSHA KABUSHIKI KAISHA (JP) | 2009-05-19 | — | — | US | disclosed |
| US-20080039634-A1 | NOVEL ONIUM SALT, ELECTROLYTE FOR NONAQUEOUS CELL CONTAINING THE NOVEL ONIUM SALT FOR NONAQUEOUS CELL AND METHOD FOR OPTIMIZING NEGATIVE ELECTRODE USING ELECTROLYTE CONTAINING ONIUM SALT | TOKUYAMA CORPORATION | 2008-02-14 | — | — | US | disclosed |
| US-20070225503-A1 | Ambient-temperature molten salts and process for producing the same | TOYOTA JIDOSHA KABUSHIKI KAISHA | 2007-09-27 | — | — | US | disclosed |
| US-20070203345-A1 | Ambient-temperature molten salts and process for producing the same | TOYOTA JIDOSHA KABUSHIKI KAISHA | 2007-08-30 | — | — | US | disclosed |
| US-20040170890-A1 | Novel onium salt, electrolyte for non-aqueous cell containing the novel onium salt for nonaqueous cell, and method for optimizing negative electrode using elecrolyte containing onium salt | NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 2004-09-02 | — | — | US | disclosed |
| EP-1414088-A1 | NOVEL ONIUM SALT, ELECTROLYTE FOR NONAQUEOUS CELL CONTAINING THE NOVEL ONIUM SALT FOR NONAQUEOUS CELL, AND METHOD FOR OPTIMIZING NEGATIVE ELECTRODE USING ELECTROLYTE CONTAINING ONIUM SALT | Tokuyama Corporation (JP) | 2004-04-28 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20070203345-A1 | Ambient-temperature molten salts and process for producing the same | AFF1, AFF2, AFF4 | CA1 1224/4885CA2 693/4885MMP1 3884/4885 |
| US-20040170890-A1 | Novel onium salt, electrolyte for non-aqueous cell containing the novel onium salt for nonaqueous cell, and method for optimizing negative electrode using elecrolyte containing onium salt | ALPL, CACNA2D3, FASTKD5 | CA1 9/4885CA2 4/4885MMP1 332/4885 |
| US-20070225503-A1 | Ambient-temperature molten salts and process for producing the same | AFF1, AFF2, AFF4 | CA1 1224/4885CA2 693/4885MMP1 3884/4885 |
| US-20080039634-A1 | NOVEL ONIUM SALT, ELECTROLYTE FOR NONAQUEOUS CELL CONTAINING THE NOVEL ONIUM SALT FOR NONAQUEOUS CELL AND METHOD FOR OPTIMIZING NEGATIVE ELECTRODE USING ELECTROLYTE CONTAINING ONIUM SALT | CA2, SLC9A2, HCN3 | CA1 28/4885CA2 1/4885MMP1 387/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.