SCHEMBL16225691

SCHEMBL16225691

Nc1ccc(C(=O)OCc2ccccc2[N+](=O)[O-])c(C(=O)OCc2ccccc2[N+](=O)[O-])c1N

nearest known ligand 0.48

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
▸ RAB9A P51151 2/20 0.48
▸ MAOB P27338 1/20 0.43
▸ ALDH1A1 P00352 4/20 0.42
▸ TSHR P16473 1/20 0.42
▸ HTT P42858 2/20 0.40
▸ MAPT P10636 4/20 0.40
▸ MEN1 O00255 1/20 0.40
▸ RECQL P46063 1/20 0.40
▸ KMT2A Q03164 1/20 0.40
▸ CTSD P07339 1/20 0.39
▸ LMNA P02545 1/20 0.39
▸ PTPN1 P18031 1/20 0.38
▸ KDM4E B2RXH2 1/20 0.38
▸ NPC1 O15118 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16924662 0.86 RAB9A (0.46) RAB9AALDH1A1HTTMAPTMEN1
SCHEMBL1058873 0.83 RAB9A (0.64) RAB9AMAOBALDH1A1TSHRHTT
SCHEMBL1058198 0.82 MAOB (0.43) RAB9AMAOBALDH1A1TSHRHTT
SCHEMBL16225736 0.81 RAB9A (0.42) RAB9AMAOBALDH1A1TSHRHTT
SCHEMBL27056783 0.80 ALDH1A1 (0.44) RAB9AMAOBALDH1A1TSHRHTT
SCHEMBL1056771 0.80 ALDH1A1 (0.44) RAB9AMAOBALDH1A1TSHRHTT
SCHEMBL16343390 0.78 RAB9A (0.43) RAB9AMAOBALDH1A1TSHRHTT
SCHEMBL31346758 0.77 ALDH1A1 (0.56) RAB9AMAOBALDH1A1TSHRHTT
SCHEMBL27056792 0.76 RAB9A (0.41) RAB9AMAOBALDH1A1TSHRHTT
SCHEMBL29547816 0.76 MEN1 (0.43) RAB9AMAOBALDH1A1TSHRHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10162260-B2 Photosensitive resin composition, protective film, and liquid crystal display element CHI MEI CORPORATION (TW) 2018-12-25 — — US disclosed
US-20170168390-A1 PHOTOSENSITIVE RESIN COMPOSITION, PROTECTIVE FILM, AND LIQUID CRYSTAL DISPLAY ELEMENT CHI MEI CORPORATION (TW) 2017-06-15 — — US disclosed
US-20140335448-A1 PHOTOSENSITIVE SILOXANE RESIN COMPOSITION AZ ELECTRONIC MATERIALS USA CORP. (US) 2014-11-13 — — US disclosed
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