Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.43 |
| ▸ | POLB | P06746 | 1/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.43 |
| ▸ | MAPT | P10636 | 2/20 | 0.40 |
| ▸ | HTT | P42858 | 2/20 | 0.40 |
| ▸ | LMNA | P02545 | 2/20 | 0.40 |
| ▸ | RAB9A | P51151 | 3/20 | 0.39 |
| ▸ | MAOB | P27338 | 1/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.38 |
| ▸ | TSHR | P16473 | 1/20 | 0.38 |
| ▸ | CTSD | P07339 | 1/20 | 0.38 |
| ▸ | GAA | P10253 | 1/20 | 0.37 |
| ▸ | NPC1 | O15118 | 2/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1056774 | 1.00 | MEN1 (0.43) | MEN1POLBKMT2AMAPTHTT | |
| SCHEMBL16343391 | 0.91 | MEN1 (0.46) | MEN1POLBKMT2AMAPTHTT | |
| SCHEMBL1053060 | 0.90 | MEN1 (0.43) | MEN1POLBKMT2AMAPTHTT | |
| SCHEMBL29790010 | 0.90 | MEN1 (0.43) | MEN1POLBKMT2AMAPTHTT | |
| SCHEMBL1058199 | 0.80 | MEN1 (0.46) | MEN1POLBKMT2AMAPTHTT | |
| SCHEMBL29790083 | 0.80 | MEN1 (0.46) | MEN1POLBKMT2AMAPTHTT | |
| SCHEMBL31346758 | 0.77 | ALDH1A1 (0.56) | MEN1POLBKMT2AMAPTHTT | |
| SCHEMBL1058873 | 0.76 | RAB9A (0.64) | MEN1POLBKMT2AMAPTHTT | |
| SCHEMBL16225691 | 0.76 | RAB9A (0.48) | MEN1KMT2AMAPTHTTLMNA | |
| SCHEMBL13685790 | 0.74 | MEN1 (0.58) | MEN1POLBKMT2AMAPTHTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113167961-B | Method for manufacturing polarizing film, optical film, and image display device | 日东电工株式会社 | 2025-02-28 | — | — | CN | disclosed |
| CN-114930211-B | Method for manufacturing polarizing film | 日东电工株式会社 | 2024-10-29 | — | — | CN | disclosed |
| CN-112444906-B | Method for manufacturing polarizing film | 日东电工株式会社 | 2024-07-26 | — | — | CN | disclosed |
| CN-112444904-B | Method for manufacturing polarizing film | 日东电工株式会社 | 2024-07-02 | — | — | CN | disclosed |
| CN-110753881-B | Alkali-developable photosensitive resin composition, dry film, cured product, and printed wiring board | 太阳控股株式会社 | 2024-06-21 | — | — | CN | disclosed |
| CN-114561172-B | Adhesive composition for polarizing film, optical film, and image display device | 日东电工株式会社 | 2024-02-06 | — | — | CN | disclosed |
| CN-113518671-B | Method for manufacturing polarizing film | 日东电工株式会社 | 2023-05-09 | — | — | CN | disclosed |
| WO-2022209816-A1 | METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE AND COMPOSITION FOR FORMING RESIST UNDERLAYER FILM | JSR株式会社 | 2022-10-06 | — | — | WO | disclosed |
| WO-2022202402-A1 | SEMICONDUCTOR SUBSTRATE PRODUCTION METHOD AND COMPOSITION FOR FORMING RESIST UNDERLAYER FILM | JSR株式会社 | 2022-09-29 | — | — | WO | disclosed |
| CN-107561863-B | Positive photosensitive resin composition and application thereof | 奇美实业股份有限公司 | 2022-09-16 | — | — | CN | disclosed |
| CN-108732831-B | Resin composition, substrate and element comprising same, and method for producing same | JSR株式会社 | 2022-08-16 | — | — | CN | disclosed |
| WO-2022071387-A1 | POLARIZING FILM, OPTICAL FILM, AND IMAGE DISPLAY DEVICE | 日東電工株式会社 | 2022-04-07 | — | — | WO | disclosed |