SCHEMBL16260781

SCHEMBL16260781

CCCCCCCCCCCCCCN(CCC(=O)O)CC(=O)O

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM5A P29375 5/20 0.58
PHF8 Q9UPP1 3/20 0.58
KDM4C Q9H3R0 3/20 0.58
GPR84 Q9NQS5 7/20 0.54
PPARG P37231 7/20 0.54
PPARD Q03181 7/20 0.54
PPARA Q07869 7/20 0.54
HDAC11 Q96DB2 5/20 0.54
TSHR P16473 4/20 0.54
PTPN1 P18031 3/20 0.54
ALDH1A1 P00352 2/20 0.54
TLR2 O60603 2/20 0.54
TDP1 Q9NUW8 2/20 0.54
FABP4 P15090 2/20 0.54
SLC22A6 Q4U2R8 1/20 0.54
SLC22A8 Q8TCC7 1/20 0.54
MEN1 O00255 1/20 0.54
ESR1 P03372 1/20 0.54
ALOX15 P16050 1/20 0.54
PDE4A P27815 1/20 0.54

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27000037 1.00 KDM5A (0.58) KDM5APHF8KDM4CGPR84PPARG
SCHEMBL195944 0.98 KDM5A (0.56) KDM5APHF8KDM4CGPR84PPARG
SCHEMBL16260779 0.92 GPR84 (0.59) KDM5APHF8KDM4CGPR84PPARG
SCHEMBL11512199 0.92 TSHR (0.54) KDM5APHF8KDM4CGPR84PPARG
SCHEMBL19821298 0.92 TSHR (0.54) KDM5APHF8KDM4CGPR84PPARG
SCHEMBL7568504 0.92 TSHR (0.54) KDM5APHF8KDM4CGPR84PPARG
SCHEMBL19821297 0.92 TSHR (0.54) KDM5APHF8KDM4CGPR84PPARG
SCHEMBL15880035 0.92 TSHR (0.54) KDM5APHF8KDM4CGPR84PPARG
SCHEMBL19040769 0.92 TSHR (0.54) KDM5APHF8KDM4CGPR84PPARG
SCHEMBL8588942 0.92 TSHR (0.54) KDM5APHF8KDM4CGPR84PPARG

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20140345483-A1 METHOD OF CONCENTRATING PLATE-MAKING PROCESS WASTE LIQUID, AND METHOD OF RECYCLING PLATE-MAKING PROCESS WASTE LIQUID FUJIFILM CORPORATION (JP) 2014-11-27 US disclosed