SCHEMBL1629241

SCHEMBL1629241

CCCCc1ccc(CC(CC)(C(=O)c2ccc(N3CCOCC3)cc2)N(C)CCCC)cc1

nearest known ligand 0.44

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
THRA P10827 1/20 0.42
THRB P10828 1/20 0.42
MAPT P10636 3/20 0.40
SMN1; SMN2 Q16637 2/20 0.40
LMNA P02545 1/20 0.40
L3MBTL1 Q9Y468 1/20 0.40
S1PR1 P21453 1/20 0.40
SLC13A5 Q86YT5 1/20 0.39
ALDH1A1 P00352 2/20 0.39
NPC1 O15118 1/20 0.39
RAB9A P51151 1/20 0.39
GSK3B P49841 1/20 0.38
MAPK1 P28482 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
HSP90AA1 P07900 1/20 0.37
HSP90AB1 P08238 1/20 0.37
NAPEPLD Q6IQ20 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1631666 0.96 MAPT (0.40) THRATHRBMAPTSMN1; SMN2LMNA
SCHEMBL8900737 0.93 MAPT (0.41) THRATHRBMAPTSMN1; SMN2LMNA
SCHEMBL1629488 0.91 THRA (0.44) THRATHRBMAPTSMN1; SMN2LMNA
SCHEMBL1631744 0.90 ALDH1A1 (0.46) MAPTSMN1; SMN2LMNAL3MBTL1ALDH1A1
SCHEMBL18905110 0.89 MAPT (0.39) THRATHRBMAPTSMN1; SMN2LMNA
SCHEMBL1629247 0.87 THRA (0.50) THRATHRBMAPTSMN1; SMN2LMNA
SCHEMBL1632618 0.85 MAPT (0.43) THRATHRBMAPTSMN1; SMN2LMNA
Butanal SCHEMBL28508291 0.84 ALDH1A1 (0.41) MAPTSMN1; SMN2LMNAL3MBTL1ALDH1A1
SCHEMBL18905100 0.83 PLA2G2A (0.39) MAPTSMN1; SMN2LMNAL3MBTL1ALDH1A1
SCHEMBL8898680 0.83 MAPT (0.47) MAPTSMN1; SMN2LMNAL3MBTL1SLC13A5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7932300-B2 Energy beam curable type ink jet printing ink JSR CORPORATION (JP) 2011-04-26 US claimed
CN-117471850-A Photosensitive composition, method for producing patterned cured product, and black matrix 东京应化工业株式会社 2024-01-30 CN disclosed
CN-115933312-A Colored photosensitive composition, cured product, and image display device 日本化药株式会社 2023-04-07 CN disclosed
CN-112650027-A Method for producing substrate for organic EL panel, and negative photosensitive resin composition 东京应化工业株式会社 2021-04-13 CN disclosed
CN-112147841-A Photosensitive composition, cured product, black matrix, black bank, color filter, image display device, and method for producing patterned cured film 东京应化工业株式会社 2020-12-29 CN disclosed
CN-105467755-B Photosensitive resin composition 东京应化工业株式会社 2020-11-13 CN disclosed
EP-2017311-B1 ENERGY RAY-CURABLE INKJET PRINTING INK JSR CORP (JP) 2012-11-21 EP disclosed
US-7932300-B2 Energy beam curable type ink jet printing ink JSR CORPORATION (JP) 2011-04-26 US disclosed
US-20090118388-A1 ENERGY RAY-CURABLE INKJET PRINTING INK JSR CORPORATION (JP) 2009-05-07 US disclosed
EP-2017311-A1 ENERGY RAY-CURABLE INKJET PRINTING INK JSR Corporation (JP) 2009-01-21 EP disclosed