SCHEMBL1635206

SCHEMBL1635206

C=C(C(=O)O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.54

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.54
TET2 Q6N021 1/20 0.34
CA1 P00915 2/20 0.33
CA2 P00918 2/20 0.33
MMP1 P03956 2/20 0.33
MMP2 P08253 2/20 0.33
MMP9 P14780 2/20 0.33
MMP8 P22894 2/20 0.33
MMP13 P45452 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1907684 0.98 THRB (0.58) THRBTET2CA1CA2MMP1
SCHEMBL9163052 0.98 THRB (0.58) THRBTET2CA1CA2MMP1
SCHEMBL466484 0.98 THRB (0.58) THRBTET2CA1CA2MMP1
SCHEMBL12475297 0.98 THRB (0.58) THRBTET2CA1CA2MMP1
SCHEMBL7083019 0.98 THRB (0.58) THRBTET2CA1CA2MMP1
SCHEMBL23522592 0.98 THRB (0.58) THRBTET2CA1CA2MMP1
SCHEMBL10933132 0.98 THRB (0.58) THRBTET2CA1CA2MMP1
SCHEMBL8457919 0.98 THRB (0.58) THRBTET2CA1CA2MMP1
SCHEMBL1635423 0.92 THRB (0.44) THRBTET2CA1CA2MMP1
Acrylic Acid SCHEMBL4649571 0.88 THRB (0.48) THRBCA1CA2MMP1MMP2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1660572-B1 ADHESIVES HAVING IMPROVED CHEMICAL RESISTANCE AND CURABLE SILICONE COMPOSITIONS FOR PREPARING THE ADHESIVES DOW CORNING (US) 2008-02-20 EP claimed
US-7148363-B2 Process for preparing acrylate compound TOSOH CORPORATION (JP) 2006-12-12 US claimed
US-6833462-B2 Esterification to get cyclic acrylate compounds; used as raw material for functional polymers, pharmaceuticals, pesticides, semiconductor lithography TOSOH CORPORATION (JP) 2004-12-21 US claimed
US-20030139613-A1 Process for preparing acrylate compound TOSOH CORPORATION 2003-07-24 US claimed
CN-115663195-B Silicon-based negative plate and preparation method thereof, lithium ion battery and electronic equipment 博路天成新能源科技有限公司 2023-03-10 CN disclosed
CN-115663195-A Silicon-based negative plate and preparation method thereof, lithium ion battery and electronic equipment 博路天成新能源科技有限公司 2023-01-31 CN disclosed
CN-107004828-B Composition for functional layer of nonaqueous secondary battery, functional layer for nonaqueous secondary battery, and nonaqueous secondary battery 日本瑞翁株式会社 2020-04-17 CN disclosed
EP-2673325-B1 METHOD FOR PRODUCING A MULTI-COAT COLOUR AND/OR EFFECT PAINT SYSTEM BASF COATINGS GMBH (DE) 2014-11-05 EP disclosed
EP-2673325-A1 METHOD FOR PRODUCING A MULTI-COAT COLOUR AND/OR EFFECT PAINT SYSTEM BASF Coatings GmbH (DE) 2013-12-18 EP disclosed
US-8378016-B2 Chemically amplified positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-02-19 US disclosed
US-20120288796-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-11-15 US disclosed
WO-2012107249-A1 METHOD FOR PRODUCING A MULTI-COAT COLOUR AND/OR EFFECT PAINT SYSTEM BASF COATINGS GMBH (DE) 2012-08-16 WO disclosed
US-20040236046-A1 Fluorine-containing polymerisable monomer and polymer prepared by using same CENTRAL GLASS COMPANY, LIMITED (JP) 2004-11-25 US disclosed
US-6784312-B2 TO PRODUCE POLYMERS THAT HAVE HIGH TRANSPARENCY IN A WIDE WAVELENGTH REGION FROM VACUUM; IMPROVED ADHESION TO THE SUBSTRATE, AND IMPROVED FILM FORMING PROPERTY; REFLECTION PREVENTIVE MATERIAL, OPTICAL DEVICE MATERIAL OR RESIST CENTRAL GLASS COMPANY, LIMITED (JP) 2004-08-31 US disclosed
US-20030139613-A1 Process for preparing acrylate compound TOSOH CORPORATION 2003-07-24 US disclosed
US-20030078352-A1 Fluorine-containing polymerisable monomer and polymer prepared by using same CENTRAL GLASS COMPANY, LIMITED (JP) 2003-04-24 US disclosed
EP-0348946-B1 Water-repellent film-forming composition KANSAI PAINT CO LTD (JP) 1994-11-23 EP disclosed
EP-0103436-B1 PROCESS FOR PREPARING 5-PERFLUOROALKYL-5,6-DIHYDROURACIL DERIVATIVES AND COMPOUNDS FOR USE THEREIN SAGAMI CHEMICAL RESEARCH CENTER (JP) 1988-11-17 EP disclosed
US-4581452-A ANTICARCINOGENIC, ANTITUMOR AGENTS; CYCLIZATION SAGAMI CHEMICAL RESEARCH CENTER (JP) 1986-04-08 US disclosed
US-4125673-A ORGANO-SILICON COMPOUNDS WACKER-CHEMIE GMBH (DE) 1978-11-14 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20030139613-A1 Process for preparing acrylate compound AFF1, AFF4, RER1 THRB 2447/4885TET2 1456/4885CA1 4242/4885
US-20030078352-A1 Fluorine-containing polymerisable monomer and polymer prepared by using same AFF1, FRG1, AFF2 THRB 3664/4885TET2 1387/4885CA1 1895/4885
US-20040236046-A1 Fluorine-containing polymerisable monomer and polymer prepared by using same AFF1, FRG1, AFF2 THRB 3664/4885TET2 1387/4885CA1 1895/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.