Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PPARA | Q07869 | 17/20 | 0.45 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.37 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.37 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.36 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.36 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.36 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.36 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18212184 | 0.87 | ALDH1A1 (0.46) | SMN1; SMN2NPSR1L3MBTL1 | |
| SCHEMBL16381778 | 0.81 | MAPT (0.44) | SMN1; SMN2NPSR1CYP1A2CYP3A4CYP2C9 | |
| SCHEMBL16745524 | 0.73 | MAPT (0.42) | SMN1; SMN2L3MBTL1 | |
| SCHEMBL16381777 | 0.72 | MAPT (0.35) | SMN1; SMN2CYP3A4CYP2C9 | |
| SCHEMBL17736488 | 0.72 | TSHR (0.44) | SMN1; SMN2CYP2C9L3MBTL1 | |
| SCHEMBL16745521 | 0.71 | MAPT (0.43) | SMN1; SMN2NPSR1CYP1A2CYP3A4CYP2C9 | |
| SCHEMBL16381785 | 0.69 | MAPT (0.45) | SMN1; SMN2NPSR1CYP1A2CYP3A4CYP2C9 | |
| SCHEMBL17364364 | 0.69 | ALDH1A1 (0.47) | SMN1; SMN2NPSR1CYP1A2CYP3A4CYP2C9 | |
| SCHEMBL17736514 | 0.69 | MAOB (0.31) | — | |
| SCHEMBL17736484 | 0.69 | MAOB (0.40) | SMN1; SMN2L3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20160320529-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT AND METHOD FOR PRODUCING SAME, METHOD FOR PRODUCING RESIN PATTERN, CURED FILM, LIQUID CRYSTAL DISPLAY DEVICE, ORGANIC EL DISPLAY DEVICE, INFRARED CUT FILTER, AND SOLID-STATE IMAGING DEVICE | FUJIFILM CORPORATION (JP) | 2016-11-03 | — | — | US | disclosed |
| US-20160320529-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT AND METHOD FOR PRODUCING SAME, METHOD FOR PRODUCING RESIN PATTERN, CURED FILM, LIQUID CRYSTAL DISPLAY DEVICE, ORGANIC EL DISPLAY DEVICE, INFRARED CUT FILTER, AND SOLID-STATE IMAGING DEVICE | FUJIFILM CORPORATION (JP) | 2016-11-03 | — | — | US | disclosed |
| US-20160131976-A1 | RESIST COMPOSITION FOR SEMICONDUCTOR MANUFACTURING PROCESS; RESIST FILM, RESIST-COATED MASK BLANKS, PHOTOMASK, AND RESIST PATTERNING METHOD USING SAID RESIST COMPOSITION; ELECTRONIC-DEVICE MANUFACTURING METHOD; AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-05-12 | — | — | US | disclosed |
| US-20160131976-A1 | RESIST COMPOSITION FOR SEMICONDUCTOR MANUFACTURING PROCESS; RESIST FILM, RESIST-COATED MASK BLANKS, PHOTOMASK, AND RESIST PATTERNING METHOD USING SAID RESIST COMPOSITION; ELECTRONIC-DEVICE MANUFACTURING METHOD; AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-05-12 | — | — | US | disclosed |
| US-9223211-B2 | Photosensitive resin compositions, processes for preparing cured films, the resulting cured films, organic EL display devices and liquid crystal display devices | FUJIFILM CORPORATION (JP) | 2015-12-29 | — | — | US | disclosed |
| US-9223211-B2 | Photosensitive resin compositions, processes for preparing cured films, the resulting cured films, organic EL display devices and liquid crystal display devices | FUJIFILM CORPORATION (JP) | 2015-12-29 | — | — | US | disclosed |
| US-20150148546-A1 | PHOTOSENSITIVE RESIN COMPOSITIONS, PROCESSES FOR PREPARING CURED FILMS, THE RESULTING CURED FILMS, ORGANIC EL DISPLAY DEVICES AND LIQUID CRYSTAL DISPLAY DEVICES | FUJIFILM CORPORATION (JP) | 2015-05-28 | — | — | US | disclosed |
| US-20150148546-A1 | PHOTOSENSITIVE RESIN COMPOSITIONS, PROCESSES FOR PREPARING CURED FILMS, THE RESULTING CURED FILMS, ORGANIC EL DISPLAY DEVICES AND LIQUID CRYSTAL DISPLAY DEVICES | FUJIFILM CORPORATION (JP) | 2015-05-28 | — | — | US | disclosed |
| WO-2014208647-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED-FILM MANUFACTURING METHOD, CURED FILM, LIQUID-CRYSTAL DISPLAY, AND ORGANIC EL DISPLAY | 富士フイルム株式会社 (JP) | 2014-12-31 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20150148546-A1 | PHOTOSENSITIVE RESIN COMPOSITIONS, PROCESSES FOR PREPARING CURED FILMS, THE RESULTING CURED FILMS, ORGANIC EL DISPLAY DEVICES AND LIQUID CRYSTAL DISPLAY DEVICES | LCP1, ARCN1, RARA | PPARA 3063/4885HDAC6 3234/4885SMN1; SMN2 2222/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.