SCHEMBL16745524

SCHEMBL16745524

Cc1ccc(S(=O)(=O)O/N=C(\C(=O)C(C)(C)C)c2nc3c(ccc4ccccc43)s2)cc1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 5/20 0.42
▸ MEN1 O00255 4/20 0.42
▸ KMT2A Q03164 4/20 0.42
▸ KDM4E B2RXH2 4/20 0.42
▸ LMNA P02545 3/20 0.42
▸ SMN1; SMN2 Q16637 3/20 0.42
▸ XIAP P98170 1/20 0.36
▸ ALOX12 P18054 1/20 0.35
▸ HKDC1 Q2TB90 1/20 0.34
▸ POLB P06746 1/20 0.34
▸ ALDH1A1 P00352 4/20 0.34
▸ HTT P42858 3/20 0.34
▸ HPGD P15428 2/20 0.34
▸ RRM1 P23921 1/20 0.33
▸ NPC1 O15118 1/20 0.33
▸ ALOX15 P16050 1/20 0.33
▸ MAPK1 P28482 1/20 0.33
▸ RAB9A P51151 1/20 0.33
▸ HSD17B10 Q99714 1/20 0.33
▸ AKR1B1 P15121 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16745517 0.86 XIAP (0.39) MAPTMEN1KMT2AKDM4ELMNA
SCHEMBL16381777 0.86 MAPT (0.35) MAPTMEN1KMT2AKDM4ELMNA
SCHEMBL16381778 0.83 MAPT (0.44) MAPTMEN1KMT2AKDM4ELMNA
SCHEMBL16381775 0.80 HKDC1 (0.36) MAPTMEN1KMT2AKDM4ELMNA
SCHEMBL24745458 0.80 HKDC1 (0.36) MAPTMEN1KMT2AKDM4ELMNA
SCHEMBL16381781 0.77 HKDC1 (0.34) MAPTMEN1KMT2AKDM4ELMNA
SCHEMBL18212184 0.75 ALDH1A1 (0.46) MAPTMEN1KMT2ALMNASMN1; SMN2
SCHEMBL17341927 0.74 RAB9A (0.39) MAPTMEN1KMT2AKDM4ELMNA
SCHEMBL16745521 0.74 MAPT (0.43) MAPTMEN1KMT2AKDM4ELMNA
SCHEMBL16381774 0.73 PPARA (0.45) SMN1; SMN2L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20160131976-A1 RESIST COMPOSITION FOR SEMICONDUCTOR MANUFACTURING PROCESS; RESIST FILM, RESIST-COATED MASK BLANKS, PHOTOMASK, AND RESIST PATTERNING METHOD USING SAID RESIST COMPOSITION; ELECTRONIC-DEVICE MANUFACTURING METHOD; AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2016-05-12 — — US disclosed
US-20160131976-A1 RESIST COMPOSITION FOR SEMICONDUCTOR MANUFACTURING PROCESS; RESIST FILM, RESIST-COATED MASK BLANKS, PHOTOMASK, AND RESIST PATTERNING METHOD USING SAID RESIST COMPOSITION; ELECTRONIC-DEVICE MANUFACTURING METHOD; AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2016-05-12 — — US disclosed
US-9223211-B2 Photosensitive resin compositions, processes for preparing cured films, the resulting cured films, organic EL display devices and liquid crystal display devices FUJIFILM CORPORATION (JP) 2015-12-29 — — US disclosed
US-9223211-B2 Photosensitive resin compositions, processes for preparing cured films, the resulting cured films, organic EL display devices and liquid crystal display devices FUJIFILM CORPORATION (JP) 2015-12-29 — — US disclosed
US-20150148546-A1 PHOTOSENSITIVE RESIN COMPOSITIONS, PROCESSES FOR PREPARING CURED FILMS, THE RESULTING CURED FILMS, ORGANIC EL DISPLAY DEVICES AND LIQUID CRYSTAL DISPLAY DEVICES FUJIFILM CORPORATION (JP) 2015-05-28 — — US disclosed
US-20150148546-A1 PHOTOSENSITIVE RESIN COMPOSITIONS, PROCESSES FOR PREPARING CURED FILMS, THE RESULTING CURED FILMS, ORGANIC EL DISPLAY DEVICES AND LIQUID CRYSTAL DISPLAY DEVICES FUJIFILM CORPORATION (JP) 2015-05-28 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20150148546-A1 PHOTOSENSITIVE RESIN COMPOSITIONS, PROCESSES FOR PREPARING CURED FILMS, THE RESULTING CURED FILMS, ORGANIC EL DISPLAY DEVICES AND LIQUID CRYSTAL DISPLAY DEVICES LCP1, ARCN1, RARA MAPT 334/4885MEN1 2896/4885KMT2A 1421/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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