⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5944187 | 0.84 | — | — | |
| SCHEMBL16409373 | 0.82 | — | — | |
| SCHEMBL196496 | 0.82 | DGAT1 (0.33) | — | |
| SCHEMBL86049 | 0.80 | ALDH1A1 (0.42) | — | |
| SCHEMBL951387 | 0.79 | — | — | |
| SCHEMBL5147025 | 0.78 | — | — | |
| SCHEMBL5142535 | 0.77 | — | — | |
| SCHEMBL5147253 | 0.77 | — | — | |
| SCHEMBL29279605 | 0.77 | — | — | |
| SCHEMBL17854912 | 0.76 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20190203065-A1 | PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORESIST COMPOSITIONS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2019-07-04 | — | — | US | disclosed |
| US-20190204741-A1 | PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORESIST COMPOSITIONS | ROHM & HAAS ELECT MAT (US) | 2019-07-04 | — | — | US | disclosed |
| US-9842993-B2 | Film-forming composition, film formed thereby, and method for manufacturing organic semiconductor element using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2017-12-12 | — | — | US | disclosed |
| US-9842993-B2 | Film-forming composition, film formed thereby, and method for manufacturing organic semiconductor element using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2017-12-12 | — | — | US | disclosed |
| US-20160181531-A1 | Film-Forming Composition, Film Formed Thereby, and Method for Manufacturing Organic Semiconductor Element Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2016-06-23 | — | — | US | disclosed |
| WO-2015008720-A1 | FILM-FORMING COMPOSITION, FILM FORMED THEREBY, AND METHOD FOR MANUFACTURING ORGANIC SEMICONDUCTOR ELEMENT USING SAME | セントラル硝子株式会社 (JP) | 2015-01-22 | — | — | WO | disclosed |