Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DGAT1 | O75907 | 1/20 | 0.33 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.32 |
| ▸ | USP2 | O75604 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5944187 | 0.84 | — | — | |
| SCHEMBL16409374 | 0.82 | — | — | |
| SCHEMBL5147025 | 0.82 | — | — | |
| SCHEMBL5192085 | 0.81 | CHRM2 (0.34) | — | |
| SCHEMBL2367896 | 0.80 | DGAT1 (0.30) | DGAT1 | |
| SCHEMBL29279605 | 0.80 | — | — | |
| SCHEMBL26103001 | 0.80 | DGAT1 (0.36) | DGAT1 | |
| SCHEMBL951387 | 0.79 | — | — | |
| SCHEMBL20100386 | 0.79 | ALDH1A1 (0.31) | — | |
| SCHEMBL12190113 | 0.79 | ALDH1A1 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 454 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107768716-B | Gel electrolyte and precursor thereof | 通用汽车环球科技运作有限责任公司 | 2020-12-08 | — | — | CN | claimed |
| US-10326166-B2 | Gel electrolytes and precursors thereof | GM Global Technology Operations LLC (US) | 2019-06-18 | — | — | US | claimed |
| CN-107768716-A | Gel electrolyte and its predecessor | 通用汽车环球科技运作有限责任公司 | 2018-03-06 | — | — | CN | claimed |
| US-20180048022-A1 | GEL ELECTROLYTES AND PRECURSORS THEREOF | GM Global Technology Operations LLC | 2018-02-15 | — | — | US | claimed |
| CN-105377917-A | Copolymers containing vinylidene fluoride and trifluoroethylene | ARKEMA FRANCE | 2016-03-02 | — | — | CN | claimed |
| US-20160046746-A1 | COPOLYMERS CONTAINING VINYLIDENE FLUORIDE AND TRIFLUOROETHYLENE | ARKEMA FRANCE (FR) | 2016-02-18 | — | — | US | claimed |
| EP-2981561-A1 | COPOLYMERS CONTAINING VINYLIDENE FLUORIDE AND TRIFLUOROETHYLENE | Arkema France (FR) | 2016-02-10 | — | — | EP | claimed |
| US-9184461-B2 | Controlled radical copolymerization of fluorinated monomers by xanthate or trithiocarbonate | ARKEMA FRANCE (FR) | 2015-11-10 | — | — | US | claimed |
| WO-2014162080-A1 | COPOLYMERS CONTAINING VINYLIDENE FLUORIDE AND TRIFLUOROETHYLENE | ARKEMA FRANCE (FR) | 2014-10-09 | — | — | WO | claimed |
| US-20140154611-A1 | CONTROLLED RADICAL COPOLYMERIZATION OF FLUORINATED MONOMERS BY XANTHATE OR TRITHIOCARBONATE | ECOLE NATIONALE SUPERIEURE DE CHIMIE DE MONTPELLIER (FR) | 2014-06-05 | — | — | US | claimed |
| US-7031589-B2 | Material for attenuating light signals with low reflectance in a fiber optic network | FURUKAWA ELECTRIC NORTH AMERICA (US) | 2006-04-18 | — | — | US | claimed |
| CN-1630551-A | Process for producing film forming resins for photoresist compositions | CLARIANT FINANCE BVI LTD (VG) | 2005-06-22 | — | — | CN | claimed |
| US-6872504-B2 | High sensitivity X-ray photoresist | MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) | 2005-03-29 | — | — | US | claimed |
| WO-2005007747-A2 | PHOTOSENSITIVE SILSESQUIOXANE RESIN | DOW CORNING CORPORATION (US) | 2005-01-27 | — | — | WO | claimed |
| US-20040264908-A1 | Material for attenuating light signals with low reflectance in a fiber optic network | FURUKAWA ELECTRIC NORTH AMERICA, INC. | 2004-12-30 | — | — | US | claimed |
| US-6794109-B2 | POLYMER CONTAINING A FLUORINATED STYRENE COPOLYMER | MASSACHUSETTS INSTITUTE OF TECHNOLOGY | 2004-09-21 | — | — | US | claimed |
| US-20040110091-A1 | High sensitivity X-ray photoresist | MASS INSTITUTE OF TECHNOLOGY (MIT) | 2004-06-10 | — | — | US | claimed |
| US-20020160297-A1 | Low abosorbing resists for 157 nm lithography | AIR FORCE, UNITED STATES | 2002-10-31 | — | — | US | claimed |
| WO-2002069043-A2 | LOW ABSORBING RESISTS FOR 157 NM LITHOGRAPHY | MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) | 2002-09-06 | — | — | WO | claimed |
| US-4613657-A | APROTIC SOLVENT ALKALI METAL ALKOXIDE, OPTICS, PAINTS, RESISTS | CENTRAL GLASS COMPANY, LIMITED (JP) | 1986-09-23 | — | — | US | claimed |