Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.35 |
| ▸ | TP53 | P04637 | 2/20 | 0.35 |
| ▸ | TSHR | P16473 | 2/20 | 0.35 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.35 |
| ▸ | PKM | P14618 | 4/20 | 0.33 |
| ▸ | ATM | Q13315 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.33 |
| ▸ | MEN1 | O00255 | 2/20 | 0.33 |
| ▸ | POLB | P06746 | 2/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.32 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.32 |
| ▸ | GAA | P10253 | 2/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16417265 | 0.92 | TP53 (0.37) | ALDH1A1TP53TSHRMAPTHSD17B10 | |
| SCHEMBL16417263 | 0.86 | ALDH1A1 (0.38) | ALDH1A1TP53TSHRMAPTHSD17B10 | |
| SCHEMBL13464399 | 0.83 | THRB (0.33) | THRB | |
| SCHEMBL12399482 | 0.75 | TSHR (0.35) | ALDH1A1TP53TSHRMAPTHSD17B10 | |
| SCHEMBL15935701 | 0.74 | TSHR (0.42) | ALDH1A1TP53TSHRMAPTATM | |
| SCHEMBL2785959 | 0.71 | THRB (0.53) | ALDH1A1TSHRMAPTPOLBTHRB | |
| SCHEMBL2742241 | 0.71 | THRB (0.41) | ALDH1A1TSHRPOLBSMN1; SMN2THRB | |
| SCHEMBL18583854 | 0.69 | THRB (0.42) | ALDH1A1TSHRPOLBTHRB | |
| SCHEMBL14703683 | 0.69 | — | — | |
| SCHEMBL13160577 | 0.68 | RAB9A (0.39) | ALDH1A1TP53TSHRHSD17B10KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20160209747-A1 | ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION, AND RESIST FILM, PATTERN FORMING METHOD, RESIST-COATED MASK BLANK, METHOD FOR PRODUCING PHOTOMASK, PHOTOMASK, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE, EACH OF WHICH USES SAID ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2016-07-21 | — | — | US | disclosed |
| US-8940476-B2 | Pattern forming method, actinic-ray-sensitive or radiation-sensitive resin composition, and resist film | FUJIFILM CORPORATION (JP) | 2015-01-27 | — | — | US | disclosed |