⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2514217 | 0.80 | — | — | |
| SCHEMBL2030950 | 0.79 | — | — | |
| SCHEMBL3953694 | 0.76 | — | — | |
| SCHEMBL450766 | 0.76 | ALDH1A1 (0.31) | — | |
| SCHEMBL108706 | 0.76 | ALDH1A1 (0.33) | — | |
| SCHEMBL14054283 | 0.75 | EPHX1 (0.30) | — | |
| SCHEMBL10615471 | 0.75 | ALDH1A1 (0.31) | — | |
| SCHEMBL453582 | 0.72 | EPHX2 (0.31) | — | |
| SCHEMBL7038409 | 0.72 | — | — | |
| SCHEMBL971472 | 0.72 | TSHR (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8735045-B2 | Positive resist composition, method of forming resist pattern, and polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-05-27 | — | — | US | disclosed |
| US-8450044-B2 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-05-28 | — | — | US | disclosed |
| JP-2011107193-A | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO LTD | 2011-06-02 | — | — | JP | disclosed |
| JP-2011107192-A | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO LTD | 2011-06-02 | — | — | JP | disclosed |
| US-20110111343-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-05-12 | — | — | US | disclosed |
| US-20110097667-A1 | POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-04-28 | — | — | US | disclosed |