Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 4/20 | 0.58 |
| ▸ | CA2 | P00918 | 4/20 | 0.58 |
| ▸ | CA7 | P43166 | 3/20 | 0.58 |
| ▸ | CA9 | Q16790 | 3/20 | 0.58 |
| ▸ | CA12 | O43570 | 2/20 | 0.58 |
| ▸ | CA14 | Q9ULX7 | 2/20 | 0.58 |
| ▸ | ACHE | P22303 | 1/20 | 0.48 |
| ▸ | TDP1 | Q9NUW8 | 5/20 | 0.46 |
| ▸ | MAPK1 | P28482 | 4/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.44 |
| ▸ | MAPT | P10636 | 2/20 | 0.44 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.44 |
| ▸ | RECQL | P46063 | 2/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.44 |
| ▸ | NPC1 | O15118 | 1/20 | 0.44 |
| ▸ | GAA | P10253 | 1/20 | 0.44 |
| ▸ | THRB | P10828 | 1/20 | 0.44 |
| ▸ | RAB9A | P51151 | 1/20 | 0.44 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.44 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28502798 | 0.91 | CA4 (0.54) | CA1CA2CA7CA9CA12 | |
| SCHEMBL18639470 | 0.89 | ESR2 (0.59) | CA1CA2CA7CA9CA12 | |
| SCHEMBL21709927 | 0.85 | CYP1A1 (0.56) | CA1CA2CA7CA9CA12 | |
| SCHEMBL21679511 | 0.84 | MEN1 (0.46) | CA1CA2CA7CA9CA12 | |
| SCHEMBL21679468 | 0.80 | KMT2A (0.39) | CA1CA2CA7CA9CA12 | |
| SCHEMBL8784562 | 0.79 | CA1 (0.58) | CA1CA2CA7CA9CA12 | |
| SCHEMBL17024447 | 0.78 | CA12 (0.53) | CA1CA2CA7CA9CA12 | |
| SCHEMBL12227837 | 0.78 | CA1 (0.65) | CA1CA2CA7CA9CA12 | |
| SCHEMBL30676990 | 0.78 | CA1 (0.65) | CA1CA2CA7CA9CA12 | |
| SCHEMBL8672704 | 0.77 | CA1 (0.55) | CA1CA2CA7CA9CA12 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 58 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11796919-B2 | Resist pattern formation method | OSAKA UNIVERSITY (JP) | 2023-10-24 | — | — | US | disclosed |
| CN-111562720-B | Photo-sensitized chemically amplified resist material, pattern forming method, semiconductor device, mask for lithography, and template for nanoimprint | 东京毅力科创株式会社 | 2023-09-29 | — | — | CN | disclosed |
| EP-3109703-B1 | PHOTOSENSITIZATION CHEMICAL-AMPLIFICATION TYPE RESIST MATERIAL, AND METHOD FOR FORMING PATTERN USING SAME | TOKYO ELECTRON LTD (JP) | 2020-12-30 | — | — | EP | disclosed |
| EP-3109703-B1 | PHOTOSENSITIZATION CHEMICAL-AMPLIFICATION TYPE RESIST MATERIAL, AND METHOD FOR FORMING PATTERN USING SAME | TOKYO ELECTRON LTD (JP) | 2020-12-30 | — | — | EP | disclosed |
| US-10031416-B2 | Reagent for enhancing generation of chemical species | TOYO GOSEI CO., LTD. (JP) | 2018-07-24 | — | — | US | disclosed |
| US-10031416-B2 | Reagent for enhancing generation of chemical species | TOYO GOSEI CO., LTD. (JP) | 2018-07-24 | — | — | US | disclosed |
| US-10031416-B2 | Reagent for enhancing generation of chemical species | TOYO GOSEI CO., LTD. (JP) | 2018-07-24 | — | — | US | disclosed |
| US-10025187-B2 | Photosensitization chemical-amplification type resist material, method for forming pattern using same, semiconductor device, mask for lithography, and template for nanoimprinting | TOKYO ELECTRON LIMITED (JP) | 2018-07-17 | — | — | US | disclosed |
| US-10025187-B2 | Photosensitization chemical-amplification type resist material, method for forming pattern using same, semiconductor device, mask for lithography, and template for nanoimprinting | TOKYO ELECTRON LIMITED (JP) | 2018-07-17 | — | — | US | disclosed |
| US-10025187-B2 | Photosensitization chemical-amplification type resist material, method for forming pattern using same, semiconductor device, mask for lithography, and template for nanoimprinting | TOKYO ELECTRON LIMITED (JP) | 2018-07-17 | — | — | US | disclosed |
| US-20160187773-A1 | REAGENT FOR ENHANCING GENERATION OF CHEMICAL SPECIES | TOYO GOSEI CO., LTD. (JP) | 2016-06-30 | — | — | US | disclosed |
| US-20160187773-A1 | REAGENT FOR ENHANCING GENERATION OF CHEMICAL SPECIES | TOYO GOSEI CO., LTD. (JP) | 2016-06-30 | — | — | US | disclosed |
| US-20150241779-A1 | REAGENT FOR ENHANCING GENERATION OF CHEMICAL SPECIES | OSAKA UNIVERSITY (JP) | 2015-08-27 | — | — | US | disclosed |
| WO-2015125495-A1 | Reagent for Enhancing Generation of Chemical Species | TOYO GOSEI CO., LTD. (JP) | 2015-08-27 | — | — | WO | disclosed |
| WO-2015052914-A1 | REAGENT FOR ENHANCING GENERATION OF CHEMICAL SPECIES AND MANUFACTURING APPARATUS | TOYO GOSEI CO., LTD. (JP) | 2015-04-16 | — | — | WO | disclosed |
| WO-2015049871-A1 | REAGENT FOR ENHANCING GENERATION OF CHEMICAL SPECIES | TOYO GOSEI CO., LTD. (JP) | 2015-04-09 | — | — | WO | disclosed |
| US-20150060728-A1 | REAGENT FOR ENHANCING GENERATION OF CHEMICAL SPECIES | TOYO GOSEI CO., LTD. (JP) | 2015-03-05 | — | — | US | disclosed |
| US-20150060728-A1 | REAGENT FOR ENHANCING GENERATION OF CHEMICAL SPECIES | TOYO GOSEI CO., LTD. (JP) | 2015-03-05 | — | — | US | disclosed |
| US-20150060728-A1 | REAGENT FOR ENHANCING GENERATION OF CHEMICAL SPECIES | TOYO GOSEI CO., LTD. (JP) | 2015-03-05 | — | — | US | disclosed |
| WO-2015019616-A1 | REAGENT FOR ENHANCING GENERATION OF CHEMICAL SPECIES | TOYO GOSEI CO., LTD. (JP) | 2015-02-12 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10025187-B2 | Photosensitization chemical-amplification type resist material, method for forming pattern using same, semiconductor device, mask for lithography, and template for nanoimprinting | ASIC1, ASIC3, CLTA | CA1 50/4885CA2 53/4885CA7 223/4885 |
| US-20150060728-A1 | REAGENT FOR ENHANCING GENERATION OF CHEMICAL SPECIES | PPOX, HMBS, CYBB | CA1 347/4885CA2 110/4885CA7 319/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.