Fluoride Ion

Fluoride Ion

SCHEMBL1645847

[Ca+2].[F-].[F-].[F-].[Li+]

nearest known ligand 0.00

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Known targets — ChEMBL curated mechanism

GABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BHMGCRMMP1MMP13MMP7MMP8PTGS1PTGS2ileSpolrplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of Fluoride Ion. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Fluoride Ion SCHEMBL1485779 0.87
Fluoride Ion SCHEMBL15194436 0.87
Fluoride Ion SCHEMBL34208 0.82
Fluoride Ion SCHEMBL29859 0.82
Fluoride Ion SCHEMBL18663523 0.82
Fluoride Ion SCHEMBL6009795 0.82
Fluoride Ion SCHEMBL10339061 0.82 CA4 (0.50)
Fluoride Ion SCHEMBL10779969 0.82
Fluoride Ion SCHEMBL2951767 0.82 CA4 (0.50)
Fluoride Ion SCHEMBL1634173 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 95 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115010151-A Lithium salt for preparing lithium ion electrolyte and lithium ion electrolyte 山东海容电源材料有限公司 2022-09-06 CN claimed
CN-101945974-A Scintillator for neutron detection and neutron detector UNIV TOHOKU 2011-01-12 CN claimed
US-6646797-B2 Exposure apparatus and method NIKON CORPORATION (JP) 2003-11-11 US claimed
US-20030090786-A1 Exposure apparatus and method NIKON CORPORATION (JP) 2003-05-15 US claimed
EP-3709356-B1 DISPLAY DEVICE SAMSUNG DISPLAY CO LTD (KR) 2026-05-20 EP disclosed
EP-4610309-A1 FLUORIDE PARTICLE DISPERSION Stella Chemifa Corporation (JP) 2025-09-03 EP disclosed
CN-120051001-A Display apparatus 三星显示有限公司 2025-05-27 CN disclosed
US-12302708-B2 Display device having first, second and third high permittivity insulation layers SAMSUNG DISPLAY CO., LTD. (KR) 2025-05-13 US disclosed
CN-119768466-A Dispersion of fluoride particles 斯泰拉化工公司 2025-04-04 CN disclosed
CN-110858606-B Display device and method of manufacturing the same 三星显示有限公司 2025-03-04 CN disclosed
CN-119277923-A Display device 三星显示有限公司 2025-01-07 CN disclosed
CN-111146354-B Flexible display device 三星显示有限公司 2024-11-26 CN disclosed
US-20070132382-A1 Sealant and flat panel display device employing the same SAMSUNG DISPLAY CO., LTD. (KR) 2007-06-14 US disclosed
US-20070126357-A1 Electroluminescent display apparatus SAMSUNG DISPLAY CO., LTD. (KR) 2007-06-07 US disclosed
CN-1971902-A Flat panel display apparatus SAMSUNG SDI CO LTD (KR) 2007-05-30 CN disclosed
EP-1783835-A2 Flat panel display apparatus Samsung SDI Co., Ltd. (KR) 2007-05-09 EP disclosed
US-20070096633-A1 Flat panel display apparatus SAMSUNG DISPLAY CO., LTD. (KR) 2007-05-03 US disclosed
US-5803974-A Chemical vapor deposition apparatus CANON KABUSHIKI KAISHA (JP) 1998-09-08 US disclosed
US-5753320-A Process for forming deposited film CANON KABUSHIKI KAISHA (JP) 1998-05-19 US disclosed
US-4455202-A Electrolytic production of lithium metal STANDARD OIL COMPANY (INDIANA) (US) 1984-06-19 US disclosed