SCHEMBL16590893

SCHEMBL16590893

C=Cc1ccc(OCCOc2ccc(S(=O)(=O)O)c3ccccc23)cc1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TDP1 Q9NUW8 1/20 0.39
▸ CHRNB2 P17787 1/20 0.38
▸ CHRNB4 P30926 1/20 0.38
▸ CHRNA3 P32297 1/20 0.38
▸ CHRNA7 P36544 1/20 0.38
▸ CHRNA4 P43681 1/20 0.38
▸ MEN1 O00255 3/20 0.38
▸ KMT2A Q03164 3/20 0.38
▸ SLC2A1 P11166 1/20 0.38
▸ THRB P10828 1/20 0.36
▸ ALDH1A1 P00352 5/20 0.35
▸ TSHR P16473 3/20 0.35
▸ HTT P42858 2/20 0.35
▸ LMNA P02545 2/20 0.35
▸ MCOLN3 Q8TDD5 1/20 0.35
▸ IDO1 P14902 1/20 0.35
▸ HPGD P15428 3/20 0.34
▸ POLB P06746 2/20 0.34
▸ MAPT P10636 1/20 0.34
▸ ALOX15 P16050 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16590890 0.80 TDP1 (0.33) TDP1SLC2A1ALDH1A1TSHRHTT
SCHEMBL11337933 0.77 SLC2A1 (0.48) MEN1KMT2ASLC2A1THRBALDH1A1
SCHEMBL11337934 0.77 SLC2A1 (0.48) MEN1KMT2ASLC2A1THRBALDH1A1
SCHEMBL11922930 0.76 TTR (0.36) TDP1MEN1KMT2AALDH1A1LMNA
SCHEMBL16590875 0.75 TDP1 (0.70) TDP1CHRNB2CHRNB4CHRNA3CHRNA7
SCHEMBL22738512 0.74 SLC2A1 (0.53) TDP1MEN1KMT2ASLC2A1ALDH1A1
SCHEMBL23649347 0.74 MEN1 (0.43) MEN1KMT2ASLC2A1ALDH1A1TSHR
SCHEMBL19186310 0.74 KMT2A (0.40) MEN1KMT2ASLC2A1ALDH1A1TSHR
SCHEMBL249761 0.73 SLC2A1 (0.54) TDP1MEN1KMT2ASLC2A1THRB
SCHEMBL13812467 0.72 TSHR (0.59) TDP1MEN1KMT2ASLC2A1THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20150086912-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND PATTERN FORMING METHOD USING THE SAME, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2015-03-26 — — US disclosed
US-20150086912-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND PATTERN FORMING METHOD USING THE SAME, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2015-03-26 — — US disclosed
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