Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | SLC2A1 | P11166 | 1/20 | 0.32 |
| ▸ | HTR1A | P08908 | 3/20 | 0.31 |
| ▸ | HTT | P42858 | 2/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.31 |
| ▸ | LMNA | P02545 | 2/20 | 0.31 |
| ▸ | TSHR | P16473 | 2/20 | 0.31 |
| ▸ | MCOLN3 | Q8TDD5 | 1/20 | 0.31 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.30 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
| ▸ | GAA | P10253 | 1/20 | 0.30 |
| ▸ | HPGD | P15428 | 1/20 | 0.30 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16590893 | 0.80 | TDP1 (0.39) | TDP1SLC2A1HTTALDH1A1LMNA | |
| SCHEMBL11922930 | 0.70 | TTR (0.36) | TDP1ALDH1A1LMNAKDM4EGAA | |
| SCHEMBL10204600 | 0.69 | ALDH1A1 (0.37) | TDP1ALDH1A1 | |
| SCHEMBL13812467 | 0.66 | TSHR (0.59) | TDP1SLC2A1HTTALDH1A1LMNA | |
| SCHEMBL11337934 | 0.65 | SLC2A1 (0.48) | SLC2A1HTTALDH1A1LMNATSHR | |
| SCHEMBL11337933 | 0.65 | SLC2A1 (0.48) | SLC2A1HTTALDH1A1LMNATSHR | |
| SCHEMBL3754233 | 0.65 | TSHR (0.58) | TDP1SLC2A1HTTALDH1A1LMNA | |
| SCHEMBL18309874 | 0.64 | ALDH1A1 (0.36) | HTTALDH1A1LMNAKDM4EGAA | |
| SCHEMBL7042929 | 0.64 | FABP4 (0.53) | TDP1HTTLMNAHPGDSMN1; SMN2 | |
| SCHEMBL19186310 | 0.63 | KMT2A (0.40) | SLC2A1HTTALDH1A1LMNATSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20150086912-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND PATTERN FORMING METHOD USING THE SAME, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2015-03-26 | — | — | US | disclosed |
| US-20150086912-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND PATTERN FORMING METHOD USING THE SAME, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2015-03-26 | — | — | US | disclosed |