SCHEMBL11922930

SCHEMBL11922930

C=Cc1ccc(OC(=O)COc2cccc3c(S(=O)(=O)O)cccc23)cc1

nearest known ligand 0.36

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
▸ TTR P02766 1/20 0.36
▸ TDP1 Q9NUW8 3/20 0.35
▸ GAA P10253 3/20 0.35
▸ CYP1A2 P05177 1/20 0.34
▸ KDM4E B2RXH2 2/20 0.34
▸ ALDH1A1 P00352 2/20 0.34
▸ HPGD P15428 2/20 0.34
▸ PTPN7 P35236 1/20 0.33
▸ PTPN12 Q05209 1/20 0.33
▸ PTPN22 Q9Y2R2 1/20 0.33
▸ LMNA P02545 1/20 0.33
▸ KMT2A Q03164 2/20 0.32
▸ MEN1 O00255 1/20 0.32
▸ MAPT P10636 1/20 0.32
▸ OGG1 O15527 1/20 0.32
▸ L3MBTL1 Q9Y468 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11922950 0.79 ALDH1A1 (0.43) TTRTDP1GAACYP1A2KDM4E
SCHEMBL23558977 0.77 GAA (0.40) TDP1GAAKDM4EALDH1A1HPGD
SCHEMBL16590893 0.76 TDP1 (0.39) TDP1GAAKDM4EALDH1A1HPGD
SCHEMBL14838099 0.75 TDP1 (0.58) TDP1GAAALDH1A1LMNAKMT2A
SCHEMBL15834039 0.74 CYP1A2 (0.39) TTRTDP1GAACYP1A2KDM4E
SCHEMBL9963681 0.72 TDP1 (0.39) TDP1GAACYP1A2KDM4EALDH1A1
SCHEMBL11922890 0.71 ALDH1A1 (0.50) TDP1GAACYP1A2ALDH1A1KMT2A
SCHEMBL2742174 0.71 TDP1 (0.38) TDP1GAAKDM4EALDH1A1HPGD
SCHEMBL16590890 0.70 TDP1 (0.33) TDP1GAAKDM4EALDH1A1HPGD
SCHEMBL11922932 0.69 TDP1 (0.44) TDP1CYP1A2KDM4EALDH1A1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120202141-A1 CHEMICAL AMPLIFICATION TYPE POSITIVE RESIST COMPOSITION, AND RESIST FILM, RESIST COATED MASK BLANKS AND RESIST PATTERN FORMING METHOD USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2012-08-09 — — US disclosed
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