Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CTSK | P43235 | 11/20 | 0.42 |
| ▸ | CTSL | P07711 | 8/20 | 0.41 |
| ▸ | CTSB | P07858 | 8/20 | 0.41 |
| ▸ | CTSH | P09668 | 5/20 | 0.40 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16590962 | 0.96 | CTSK (0.39) | CTSKCTSLCTSBCTSH | |
| SCHEMBL16590910 | 0.87 | CTSL (0.38) | CTSKCTSLCTSBCTSH | |
| SCHEMBL20696777 | 0.83 | CTSK (0.32) | CTSKCTSLCTSBCTSH | |
| SCHEMBL11231610 | 0.79 | CTSK (0.47) | CTSKCTSLCTSBCTSHCYP1A2 | |
| SCHEMBL192070 | 0.79 | CTSK (0.47) | CTSKCTSLCTSBCTSHCYP1A2 | |
| SCHEMBL16590911 | 0.77 | CTSK (0.34) | CTSKCTSLCTSBCTSH | |
| SCHEMBL14537236 | 0.77 | CTSK (0.45) | CTSKCTSLCTSBCTSHCYP1A2 | |
| SCHEMBL6379630 | 0.77 | SHBG (0.41) | CYP1A2 | |
| SCHEMBL3414449 | 0.77 | SHBG (0.41) | CYP1A2 | |
| SCHEMBL108743 | 0.77 | SHBG (0.41) | CYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20150293446-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-10-15 | — | — | US | disclosed |
| US-20150086912-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND PATTERN FORMING METHOD USING THE SAME, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2015-03-26 | — | — | US | disclosed |