SCHEMBL1660503

SCHEMBL1660503

CCCCC(CCCC)C(C)(N=NC(C)(C)C(=O)O)C(=O)O

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA2 P00918 7/20 0.40
MAPK1 P28482 1/20 0.40
CA1 P00915 4/20 0.35
SLC1A2 P43004 2/20 0.35
SLC1A1 P43005 2/20 0.35
SLC1A3 P43003 1/20 0.35
FDPS P14324 1/20 0.35
CTSK P43235 2/20 0.33
PDF Q9HBH1 1/20 0.33
CTSS P25774 1/20 0.32
GPR84 Q9NQS5 3/20 0.32
FFAR1 O14842 1/20 0.32
MEN1 O00255 1/20 0.31
HPGD P15428 1/20 0.31
RECQL P46063 1/20 0.31
KMT2A Q03164 1/20 0.31
HSD17B10 Q99714 1/20 0.31
HSPD1 P10809 1/20 0.31
BLM P54132 1/20 0.31
HSPE1 P61604 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3409125 1.00 CA2 (0.40) CA2MAPK1CA1SLC1A2SLC1A1
SCHEMBL29924654 0.93 CA2 (0.45) CA2MAPK1CA1SLC1A2SLC1A1
SCHEMBL10395138 0.86
SCHEMBL4199552 0.85 ACACB (0.32)
SCHEMBL4199555 0.85 ACACB (0.32)
SCHEMBL185293 0.83 TSHR (0.31)
SCHEMBL185294 0.83 TSHR (0.31)
SCHEMBL4198189 0.79
SCHEMBL29924096 0.75 TSHR (0.36) CA2MAPK1
SCHEMBL6570627 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 48 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025079618-A1 MICROFLUIDIC SYSTEM, REACTION METHOD FOR EMPLOYING MICROFLUIDIC SYSTEM, AND METHOD FOR PRODUCING POLYMER 株式会社ダイセル 2025-04-17 WO disclosed
WO-2025079620-A1 MICROFLUIDIC SYSTEM, PROCESSING METHOD USING MICROFLUIDIC SYSTEM, AND METHOD FOR PRODUCING POLYMER 株式会社ダイセル 2025-04-17 WO disclosed
WO-2025079622-A1 MICROFLUIDIC SYSTEM, REACTION METHOD USING MICROFLUIDIC SYSTEM, AND METHOD FOR PRODUCING POLYMER 株式会社ダイセル 2025-04-17 WO disclosed
WO-2024248064-A1 POLYMER, PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SAME, COPPER PASTE, LIQUID COMPOSITION, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND METHOD FOR PRODUCING COPPER PILLAR FOR SEMICONDUCTOR CONNECTION 株式会社ダイセル 2024-12-05 WO disclosed
WO-2024248066-A1 POLYMER, PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SAME, COPPER PASTE, LIQUID COMPOSITION, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING COPPER PILLAR FOR SEMICONDUCTOR CONNECTION 株式会社ダイセル 2024-12-05 WO disclosed
WO-2024248065-A1 POLYMER AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SAME, COPPER PASTE, LIQUID COMPOSITION, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING COPPER PILLAR FOR SEMICONDUCTOR CONNECTION 株式会社ダイセル 2024-12-05 WO disclosed
US-11932723-B2 High-purity 3,4-epoxycyclohexylmethyl methacrylate DAICEL CORPORATION (JP) 2024-03-19 US disclosed
US-20240084047-A1 METHOD FOR MANUFACTURING POLYMER DAICEL CORPORATION (JP) 2024-03-14 US disclosed
US-11915925-B2 Semiconductor device manufacturing method DAICEL CORPORATION (JP) 2024-02-27 US disclosed
US-11887975-B2 Semiconductor device manufacturing method DAICEL CORPORATION (JP) 2024-01-30 US disclosed
EP-2308905-A1 CURABLE COPOLYMER AND CURABLE RESIN COMPOSITION Daicel Chemical Industries, Ltd. (JP) 2011-04-13 EP disclosed
US-20100210801-A1 COPOLYMER DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2010-08-19 US disclosed
US-20100137515-A1 PHOTO- AND/OR THERMO-CURABLE COPOLYMER, CURABLE RESIN COMPOSITIONS, AND CURED ARTICLES DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2010-06-03 US disclosed
EP-2184303-A1 COPOLYMER Daicel Chemical Industries, Ltd. (JP) 2010-05-12 EP disclosed
US-20100029956-A1 METHOD FOR PRODUCING ESTER OR LACTONE DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2010-02-04 US disclosed
EP-2147937-A1 PHOTO- AND/OR THERMO-CURABLE COPOLYMER, CURABLE RESIN COMPOSITIONS, AND CURED ARTICLES Daicel Chemical Industries, Ltd. (JP) 2010-01-27 EP disclosed
EP-2123646-A1 METHOD FOR PRODUCING ESTER OR LACTONE Daicel Chemical Industries, Ltd. (JP) 2009-11-25 EP disclosed
US-7163982-B2 Process for preparing fluorine-containing polymer and method of forming fine pattern using same DAIKI INDUSTRIES, LTD. (JP) 2007-01-16 US disclosed
US-20050049374-A1 Process for preparing fluorine-containing polymer and method of forming fine pattern using same DAIKIN INDUSTRIES, LTD 2005-03-03 US disclosed
EP-0761698-A2 Process for preparing polymers based on basic vinyl monomers BASF AKTIENGESELLSCHAFT (DE) 1997-03-12 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100029956-A1 METHOD FOR PRODUCING ESTER OR LACTONE RIOX2, CBR1, AKR7A2 CA2 834/4885MAPK1 2959/4885CA1 44/4885
US-11932723-B2 High-purity 3,4-epoxycyclohexylmethyl methacrylate MEP1A, MEP1B, FTO CA2 4216/4885MAPK1 2011/4885CA1 3975/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.