SCHEMBL16628461

SCHEMBL16628461

O=C=NC1CC(N=C=O)C(N=C=O)CC1N=C=O

nearest known ligand 0.41

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8924200 1.00
SCHEMBL7611956 1.00
SCHEMBL15010749 0.84 ALDH1A1 (0.48) ALDH1A1
SCHEMBL502747 0.79 ALDH1A1 (0.48) ALDH1A1
SCHEMBL7264968 0.79 ALDH1A1 (0.48) ALDH1A1
SCHEMBL9013055 0.78
SCHEMBL185680 0.78 ALDH1A1 (0.36) ALDH1A1
SCHEMBL19994041 0.78
SCHEMBL8416325 0.78
SCHEMBL9012729 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117865841-A Electrolyte, electrochemical device, lithium ion secondary battery and assembly 大金工业株式会社 2024-04-12 CN disclosed
CN-111557061-B Electrolyte, electrochemical device, lithium ion secondary battery and assembly 大金工业株式会社 2024-01-05 CN disclosed
CN-111247681-B Electrolyte, electrochemical device, lithium ion secondary battery and assembly 大金工业株式会社 2023-07-14 CN disclosed
CN-116154292-A Electrolyte, electrochemical device, lithium ion secondary battery and assembly 大金工业株式会社 2023-05-23 CN disclosed
CN-113039253-B Double-liquid mixed adhesive 株式会社E-TEC 2023-05-12 CN disclosed
US-20220025232-A1 TWO-COMPONENT ADHESIVE EMULSION TECHNOLOGY CO., LTD. (JP) 2022-01-27 US disclosed
CN-113039253-A Two-liquid mixed adhesive 株式会社E-TEC 2021-06-25 CN disclosed
EP-3229075-B1 PHOTORESIST COMPOSITION, METHOD FOR MANUFACTURING SAME, AND METHOD FOR FORMING RESIST PATTERN JSR CORP (JP) 2021-01-06 EP disclosed
US-10725376-B2 Pattern-forming method JSR CORPORATION (JP) 2020-07-28 US disclosed
US-20200041898-A1 RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN-FORMING METHOD JSR CORPORATION (JP) 2020-02-06 US disclosed
US-10090163-B2 Inorganic film-forming composition for multilayer resist processes, and pattern-forming method JSR CORPORATION (JP) 2018-10-02 US disclosed
US-20170362412-A1 COMPOSITION FOR FILM FORMATION, AND PATTERN-FORMING METHOD JSR CORPORATION (JP) 2017-12-21 US disclosed
EP-3229075-A1 PHOTORESIST COMPOSITION, METHOD FOR MANUFACTURING SAME, AND METHOD FOR FORMING RESIST PATTERN JSR Corporation (JP) 2017-10-11 EP disclosed
US-20170269476-A1 PHOTORESIST COMPOSITION, PRODUCTION METHOD OF PHOTORESIST COMPOSITION, AND RESIST PATTERN-FORMING METHOD JSR CORPORATION (JP) 2017-09-21 US disclosed
US-20170184961-A1 PATTERN-FORMING METHOD JSR CORPORATION (JP) 2017-06-29 US disclosed
US-20160349616-A1 SEMICONDUCTOR DEVICE PRODUCTION COMPOSITION AND PATTERN FORMATION METHOD JSR CORPORATION (JP) 2016-12-01 US disclosed
US-20150364332-A1 INORGANIC FILM-FORMING COMPOSITION FOR MULTILAYER RESIST PROCESSES, AND PATTERN-FORMING METHOD JSR CORPORATION (JP) 2015-12-17 US disclosed
US-20150284539-A1 COMPOSITION FOR FILM FORMATION, AND PATTERN-FORMING METHOD JSR CORPORATION (JP) 2015-10-08 US disclosed
US-20150105485-A1 URETHANE FOAM RUBBER AND COMPOSITION FOR FORMING URETHANE FOAM RUBBER YAMAHA CORPORATION (JP) 2015-04-16 US disclosed
EP-2860208-A1 Urethane foam rubber and composition for forming urethane foam rubber YAMAHA CORPORATION (JP) 2015-04-15 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10090163-B2 Inorganic film-forming composition for multilayer resist processes, and pattern-forming method HCAR1, HSD17B7, BMPR1A ALDH1A1 749/4885
US-20150364332-A1 INORGANIC FILM-FORMING COMPOSITION FOR MULTILAYER RESIST PROCESSES, AND PATTERN-FORMING METHOD HCAR1, HSD17B7, BMPR1A ALDH1A1 749/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.