Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PNMT | P11086 | 1/20 | 0.36 |
| ▸ | SRC | P12931 | 1/20 | 0.34 |
| ▸ | GABRA1 | P14867 | 2/20 | 0.33 |
| ▸ | GABRB2 | P47870 | 2/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2401855 | 0.88 | PNMT (0.34) | PNMT | |
| SCHEMBL11208617 | 0.86 | MAPT (0.35) | PNMT | |
| SCHEMBL2419729 | 0.85 | LIPG (0.33) | PNMT | |
| SCHEMBL7943734 | 0.84 | PNMT (0.36) | PNMT | |
| SCHEMBL11002342 | 0.84 | PNMT (0.36) | PNMT | |
| SCHEMBL1042034 | 0.84 | PNMT (0.36) | PNMT | |
| SCHEMBL1554116 | 0.83 | GABRA1 (0.39) | PNMTGABRA1GABRB2 | |
| SCHEMBL156108 | 0.83 | LIPG (0.41) | — | |
| SCHEMBL4912937 | 0.83 | LIPG (0.41) | — | |
| SCHEMBL7158739 | 0.83 | SRC (0.31) | SRC |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 168 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119798787-A | Mesoporous material compound, preparation method thereof, photosensitive resin composition and preparation method thereof | 上海信斯帝克新材料有限公司 | 2025-04-11 | — | — | CN | claimed |
| EP-2820073-B1 | GLOSS-CONTROLLABLE, RADIATION-CURABLE INKJET INK | ELECTRONICS FOR IMAGING INC (US) | 2018-09-05 | — | — | EP | claimed |
| US-9260616-B2 | Gloss-controllable, radiation-curable inkjet ink | ELECTRONICS FOR IMAGING, INC. (US) | 2016-02-16 | — | — | US | claimed |
| CN-104508025-A | Gloss-controllable, radiation-curable inkjet inks | ELECTRONICS FOR IMAGING INC | 2015-04-08 | — | — | CN | claimed |
| EP-2820073-A1 | GLOSS-CONTROLLABLE, RADIATION-CURABLE INKJET INK | Electronics for Imaging, Inc. (US) | 2015-01-07 | — | — | EP | claimed |
| WO-2013130618-A1 | GLOSS-CONTROLLABLE, RADIATION-CURABLE INKJET INK | ELECTRONICS FOR IMAGING, INC. (US) | 2013-09-06 | — | — | WO | claimed |
| US-20130222499-A1 | GLOSS-CONTROLLABLE, RADIATION-CURABLE INKJET INK | GLAS USA LLC [SUCCESSOR COLLATERAL AGENT] | 2013-08-29 | — | — | US | claimed |
| WO-2012028825-A1 | ULTRA-THIN FILMS OF MOLECULARLY IMPRINTED POLYMERS CONFINED TO THE SURFACE OF A SUBSTRATE | UNIVERSITE PARIS DIDEROT-PARIS 7 (FR) | 2012-03-08 | — | — | WO | claimed |
| WO-2007092935-A1 | HYDROXYALKYLAMINOALKYLTHIOXANTHONES | ALBEMARLE CORPORATION (US) | 2007-08-16 | — | — | WO | claimed |
| US-6815140-B2 | COMPRISING A NOVOLAC RESIN, A RADIATION-SENSITIVE QUINONEDIAZIDE COMPOUND, AND ALSO A THIOXANTHONE COMPOUND TO IMPROVE RESOLUTION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2004-11-09 | — | — | US | claimed |
| US-20020006574-A1 | Comprising a novolac resin, a radiation-sensitive quinonediazide compound, and also a thioxanthone compound to improve resolution | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-01-17 | — | — | US | claimed |
| US-20010026905-A1 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED | 2001-10-04 | — | — | US | claimed |
| EP-0962826-A1 | A positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1999-12-08 | — | — | EP | claimed |
| EP-0160724-B1 | SEALING COMPOSITION, PROCESS FOR ITS PREPARATION, AND ITS USE | Kunststoff- & Lackfabrik Kemper (DE) | 1988-08-03 | — | — | EP | claimed |
| CN-120005445-A | Advertisement spray painting UV ink for PVC soft film and preparation method thereof | 珠海天威新材料股份有限公司 | 2025-05-16 | — | — | CN | disclosed |
| CN-119798787-A | Mesoporous material compound, preparation method thereof, photosensitive resin composition and preparation method thereof | 上海信斯帝克新材料有限公司 | 2025-04-11 | — | — | CN | disclosed |
| US-20240408595-A1 | STRUCTURE COMPRISING MICROCHANNEL, PRODUCTION METHOD FOR SAID STRUCTURE, AND MICROCHANNEL DEVICE | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-12-12 | — | — | US | disclosed |
| EP-0412570-A2 | Light- and heat-sensitive recording material | FUJI PHOTO FILM CO., LTD. (JP) | 1991-02-13 | — | — | EP | disclosed |
| EP-0280295-A2 | A heat-resistant photosensitive resin composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1988-08-31 | — | — | EP | disclosed |
| EP-0212238-A2 | Heat activatable adhesive for wire scribed circuits | Advanced Interconnection Technology, Inc. (US) | 1987-03-04 | — | — | EP | disclosed |