Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 2/20 | 0.70 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.70 |
| ▸ | ENPP2 | Q13822 | 4/20 | 0.59 |
| ▸ | ENPP1 | P22413 | 4/20 | 0.59 |
| ▸ | EGFR | P00533 | 3/20 | 0.59 |
| ▸ | ENPP3 | O14638 | 3/20 | 0.59 |
| ▸ | ABL1 | P00519 | 2/20 | 0.59 |
| ▸ | ABL2 | P42684 | 1/20 | 0.58 |
| ▸ | GFER | P55789 | 1/20 | 0.57 |
| ▸ | PPARG | P37231 | 1/20 | 0.57 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.57 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.57 |
| ▸ | STAT3 | P40763 | 1/20 | 0.56 |
| ▸ | GAA | P10253 | 2/20 | 0.55 |
| ▸ | MAPT | P10636 | 2/20 | 0.55 |
| ▸ | G6PD | P11413 | 1/20 | 0.55 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.55 |
| ▸ | LMNA | P02545 | 1/20 | 0.53 |
| ▸ | SRD5A2 | P31213 | 1/20 | 0.52 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8496744 | 0.91 | KMT2A (0.76) | MEN1KMT2AENPP2ENPP1EGFR | |
| Hydrochloric Acid SCHEMBL7053221 | 0.90 | KMT2A (0.73) | MEN1KMT2AENPP2ENPP1EGFR | |
| SCHEMBL4325565 | 0.87 | KMT2A (0.70) | MEN1KMT2AENPP2ENPP1ENPP3 | |
| SCHEMBL30899144 | 0.86 | MEN1 (0.64) | MEN1KMT2AENPP2ENPP1EGFR | |
| SCHEMBL27472523 | 0.86 | ALDH1A1 (0.59) | MEN1KMT2AENPP2ENPP1ENPP3 | |
| SCHEMBL4126086 | 0.86 | MEN1 (0.60) | MEN1KMT2AENPP2ENPP1ENPP3 | |
| SCHEMBL18179825 | 0.86 | MEN1 (0.60) | MEN1KMT2AENPP2ENPP1ENPP3 | |
| SCHEMBL9852204 | 0.86 | MEN1 (0.60) | MEN1KMT2AENPP2ENPP1ENPP3 | |
| SCHEMBL1665319 | 0.85 | ENPP1 (0.61) | MEN1KMT2AENPP2ENPP1ENPP3 | |
| SCHEMBL16182665 | 0.85 | MEN1 (0.68) | MEN1KMT2AENPP1EGFRENPP3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119191978-A | Method for synthesizing meta-secondary alkyl substituted aryl carboxylic acid | 华南理工大学 | 2024-12-27 | — | — | CN | disclosed |
| US-11774853-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-03 | — | — | US | disclosed |
| CN-111018691-B | Green synthesis method of aromatic acid | 中国科学技术大学 | 2022-03-01 | — | — | CN | disclosed |
| US-11187980-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-11-30 | — | — | US | disclosed |
| US-20210302838-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-09-30 | — | — | US | disclosed |
| US-20200241414-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-07-30 | — | — | US | disclosed |
| US-20200192222-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-06-18 | — | — | US | disclosed |
| CN-111018691-A | Green synthesis method of aromatic acid | 中国科学技术大学 | 2020-04-17 | — | — | CN | disclosed |
| US-20200073237-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-03-05 | — | — | US | disclosed |
| US-10474030-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-11-12 | — | — | US | disclosed |
| US-9360753-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-06-07 | — | — | US | disclosed |
| US-9164383-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-10-20 | — | — | US | disclosed |
| US-20130029270-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-01-31 | — | — | US | disclosed |
| US-20120202153-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-08-09 | — | — | US | disclosed |
| US-20120202153-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-08-09 | — | — | US | disclosed |
| EP-2314581-B1 | A process for preparing benzo[b]thiophene derivatives | HEXAL AG (DE) | 2012-07-25 | — | — | EP | disclosed |
| WO-2011047877-A1 | A PROCESS FOR PREPARING BENZO[B]THIOPHENE DERIVATIVES | HEXAL AKTIENGESELLSCHAFT (DE) | 2011-04-28 | — | — | WO | disclosed |
| EP-2314581-A1 | A process for preparing benzo[b]thiophene derivatives | Hexal AG (DE) | 2011-04-27 | — | — | EP | disclosed |
| US-4520026-A | ANTIARRHYTHMIA AGENTS | S. A. LABAZ N.V. (BE) | 1985-05-28 | — | — | US | disclosed |
| US-4378362-A | CARDIOVASCULAR DISORDERS | S.A. LABAZ N.V. (BE) | 1983-03-29 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20200241414-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | INSR, HNRNPU, HNRNPR | MEN1 2251/4885KMT2A 1882/4885ENPP2 4352/4885 |
| US-10474030-B2 | Resist composition and patterning process | CASR, HNRNPU, LBR | MEN1 3269/4885KMT2A 2749/4885ENPP2 3803/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.