Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 1/20 | 0.46 |
| ▸ | PDK2 | Q15119 | 1/20 | 0.44 |
| ▸ | KDM4C | Q9H3R0 | 1/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.42 |
| ▸ | MYC | P01106 | 1/20 | 0.41 |
| ▸ | DAPK3 | O43293 | 1/20 | 0.41 |
| ▸ | JAK2 | O60674 | 1/20 | 0.41 |
| ▸ | PRKD3 | O94806 | 1/20 | 0.41 |
| ▸ | MAP4K4 | O95819 | 1/20 | 0.41 |
| ▸ | PAK4 | O96013 | 1/20 | 0.41 |
| ▸ | ABL1 | P00519 | 1/20 | 0.41 |
| ▸ | CSF1R | P07333 | 1/20 | 0.41 |
| ▸ | RET | P07949 | 1/20 | 0.41 |
| ▸ | MET | P08581 | 1/20 | 0.41 |
| ▸ | PDGFRB | P09619 | 1/20 | 0.41 |
| ▸ | PIM1 | P11309 | 1/20 | 0.41 |
| ▸ | FGFR1 | P11362 | 1/20 | 0.41 |
| ▸ | PDGFRA | P16234 | 1/20 | 0.41 |
| ▸ | PRKACA | P17612 | 1/20 | 0.41 |
| ▸ | FLT1 | P17948 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1667181 | 0.93 | THRB (0.52) | THRBPDK2KDM4CKMT2AMYC | |
| SCHEMBL978600 | 0.89 | KDM4C (0.50) | PDK2KDM4CKMT2AMYCDAPK3 | |
| SCHEMBL978601 | 0.86 | HNF4A (0.52) | THRBKMT2AKDM4EALDH1A1SMN1; SMN2 | |
| SCHEMBL27895869 | 0.84 | HNF4A (0.50) | KMT2AKDM4EALDH1A1SMN1; SMN2FOLH1 | |
| Water SCHEMBL11421779 | 0.84 | HNF4A (0.50) | THRBKMT2AKDM4EALDH1A1SMN1; SMN2 | |
| SCHEMBL600052 | 0.84 | THRB (0.56) | THRBPDK2KMT2ACYP3A4LMNA | |
| SCHEMBL30955031 | 0.80 | BCAT2 (0.57) | KDM4CKMT2ACHEK1KDM4EALDH1A1 | |
| SCHEMBL9223049 | 0.80 | CYP3A4 (0.60) | KDM4CMYCCYP3A4CYP2C9ALOX12 | |
| SCHEMBL11433650 | 0.80 | PTGER1 (0.50) | KDM4CKMT2ACHEK1KDM4ESMN1; SMN2 | |
| SCHEMBL28012737 | 0.79 | AKR1C3 (0.55) | KDM4CKMT2ACYP2C9ALDH1A1MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1830228-B1 | COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2015-08-05 | — | — | EP | disclosed |
| EP-2808736-A2 | Compound for resist and radiation-sensitive composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-12-03 | — | — | EP | disclosed |
| US-8802353-B2 | Compound for resist and radiation-sensitive composition specification | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-08-12 | — | — | US | disclosed |
| EP-2662727-A2 | Compound for resist and radiation-sensitive composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2013-11-13 | — | — | EP | disclosed |
| US-8350096-B2 | Compound for resist and radiation-sensitive composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2013-01-08 | — | — | US | disclosed |
| US-20130004896-A1 | COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION SPECIFICATION | ECHIGO MASATOSHI (JP) | 2013-01-03 | — | — | US | disclosed |
| US-20110165516-A1 | COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION | ECHIGO MASATOSHI | 2011-07-07 | — | — | US | disclosed |
| US-7919223-B2 | Polyphenol compound synthesized by condensation between aromatic ketone or aldehyde and a phenol; acid-amplified, non-polymeric resist; highly sensitive to KrF excimer lasers, extreme ultraviolet rays, electron beams, X-rays; resist patterns with high resolution, high heat, etch resistance | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2011-04-05 | — | — | US | disclosed |
| US-20080113294-A1 | Compound for Resist and Radiation-Sensitive Composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2008-05-15 | — | — | US | disclosed |
| EP-1830228-A1 | COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2007-09-05 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110165516-A1 | COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION | XRCC6, XRCC5, KISS1R | THRB 2944/4885PDK2 626/4885KDM4C 31/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.