Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.67 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.67 |
| ▸ | LMNA | P02545 | 4/20 | 0.64 |
| ▸ | CES2 | O00748 | 3/20 | 0.64 |
| ▸ | CES1 | P23141 | 3/20 | 0.64 |
| ▸ | SRC | P12931 | 1/20 | 0.61 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.52 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.52 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.50 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.50 |
| ▸ | MDM2 | Q00987 | 1/20 | 0.48 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.48 |
| ▸ | TSHR | P16473 | 2/20 | 0.48 |
| ▸ | DAO | P14920 | 1/20 | 0.48 |
| ▸ | NAPRT | Q6XQN6 | 1/20 | 0.48 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.46 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.45 |
| ▸ | MITF | O75030 | 1/20 | 0.44 |
| ▸ | HTT | P42858 | 1/20 | 0.44 |
| ▸ | RAB9A | P51151 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28025801 | 0.98 | TDP1 (0.64) | TDP1L3MBTL1LMNACES2CES1 | |
| SCHEMBL29586362 | 0.98 | TDP1 (0.64) | TDP1L3MBTL1LMNACES2CES1 | |
| SCHEMBL56317 | 0.91 | SRC (0.70) | TDP1L3MBTL1LMNACES2CES1 | |
| SCHEMBL8990032 | 0.89 | TDP1 (0.59) | TDP1L3MBTL1LMNACES2CES1 | |
| SCHEMBL23457197 | 0.87 | TDP1 (0.57) | TDP1L3MBTL1LMNACES2CES1 | |
| SCHEMBL600680 | 0.87 | TDP1 (0.57) | TDP1L3MBTL1LMNACES2CES1 | |
| SCHEMBL11387985 | 0.86 | TDP1 (0.52) | TDP1L3MBTL1LMNACES2CES1 | |
| SCHEMBL1669184 | 0.85 | CES2 (0.55) | TDP1L3MBTL1LMNACES2CES1 | |
| SCHEMBL22125607 | 0.83 | L3MBTL1 (0.53) | TDP1L3MBTL1LMNACES2CES1 | |
| SCHEMBL11387982 | 0.83 | ANPEP (0.54) | TDP1L3MBTL1LMNACES2CES1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108060308-B | Method and device for separating lithium from lithium-containing solution | 中南大学 | 2020-01-03 | — | — | CN | claimed |
| CN-108060308-A | A kind of method and device of the separating Li from lithium-containing solution | 中南大学 | 2018-05-22 | — | — | CN | claimed |
| CN-115215727-B | High energy efficiency preparation method of alkali metal alkoxide | 赢创运营有限公司 | 2024-03-01 | — | — | CN | disclosed |
| CN-115215728-B | High energy efficiency preparation method of alkali metal alkoxide | 赢创运营有限公司 | 2024-02-09 | — | — | CN | disclosed |
| CN-115215728-A | High-energy-efficiency preparation method of alkali metal alkoxide | 赢创功能性解决方案有限公司 | 2022-10-21 | — | — | CN | disclosed |
| CN-108060308-B | Method and device for separating lithium from lithium-containing solution | 中南大学 | 2020-01-03 | — | — | CN | disclosed |
| CN-108060308-A | A kind of method and device of the separating Li from lithium-containing solution | 中南大学 | 2018-05-22 | — | — | CN | disclosed |
| EP-1830228-B1 | COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2015-08-05 | — | — | EP | disclosed |
| EP-2808736-A2 | Compound for resist and radiation-sensitive composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-12-03 | — | — | EP | disclosed |
| US-8802353-B2 | Compound for resist and radiation-sensitive composition specification | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-08-12 | — | — | US | disclosed |
| EP-2662727-A2 | Compound for resist and radiation-sensitive composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2013-11-13 | — | — | EP | disclosed |
| US-7816020-B2 | Organic electroluminescent device | NIPPON STEEL CHEMICAL CO., LTD. (JP) | 2010-10-19 | — | — | US | disclosed |
| US-20080113294-A1 | Compound for Resist and Radiation-Sensitive Composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2008-05-15 | — | — | US | disclosed |
| US-20080093984-A1 | Organic Electroluminescent Device | NIPPON STEEL & SUMIKIN CHEMICAL CO., LTD. (JP) | 2008-04-24 | — | — | US | disclosed |
| US-20080093984-A1 | Organic Electroluminescent Device | NIPPON STEEL & SUMIKIN CHEMICAL CO., LTD. (JP) | 2008-04-24 | — | — | US | disclosed |
| US-20080093984-A1 | Organic Electroluminescent Device | NIPPON STEEL & SUMIKIN CHEMICAL CO., LTD. (JP) | 2008-04-24 | — | — | US | disclosed |
| CN-101088046-A | Compound for resist and radiation-sensitive composition | MITSUBISHI GAS CHEMICAL CO (JP) | 2007-12-12 | — | — | CN | disclosed |
| EP-1830228-A1 | COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2007-09-05 | — | — | EP | disclosed |
| US-6458972-B1 | THERMAL CLEAVAGE OF MACROCYCLIC ESTERS IN THE PRESENCE OF A THERMOSTABLE BENZENE DERIVATIVE | HAARMANN & REIMER GMBH (DE) | 2002-10-01 | — | — | US | disclosed |
| US-20020095045-A1 | Process for the preparation of macrocyclic esters | SYMRISE GMBH & CO., KG (DE) | 2002-07-18 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20020095045-A1 | Process for the preparation of macrocyclic esters | CYP3A4, CYP4A11, CASP14 | TDP1 2295/4885L3MBTL1 3796/4885LMNA 503/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.