SCHEMBL16675611

SCHEMBL16675611

Cc1cc(-c2ccc(C(C)(c3cc(C)c(O)c(C)c3)c3cc(C)c(O)c(C)c3)cc2)cc(C)c1O

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 2/20 0.56
CA2 P00918 2/20 0.56
CYP1A2 P05177 1/20 0.48
CYP2C9 P11712 1/20 0.48
CYP2C19 P33261 1/20 0.48
ESR1 P03372 6/20 0.47
ESR2 Q92731 4/20 0.47
AKR1C2 P52895 1/20 0.38
AKR1C1 Q04828 1/20 0.38
RXRB P28702 4/20 0.38
CYP17A1 P05093 1/20 0.36
FYN P06241 1/20 0.36
HSD17B1 P14061 1/20 0.35
HSD17B2 P37059 1/20 0.35
RXRA P19793 3/20 0.35
ALDH1A1 P00352 1/20 0.34
AR P10275 1/20 0.34
MEN1 O00255 1/20 0.34
KMT2A Q03164 1/20 0.34
RXRG P48443 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12006459 0.90 ESR1 (0.53) CA1CA2ESR1ESR2ALDH1A1
SCHEMBL2618675 0.89 ESR1 (0.55) CA1CA2CYP1A2CYP2C9CYP2C19
SCHEMBL12004194 0.89 ESR1 (0.59) CA1CA2CYP2C19ESR1ESR2
SCHEMBL13609942 0.83 ESR1 (0.59) CA1CA2CYP1A2CYP2C9CYP2C19
SCHEMBL12004409 0.83 ESR1 (0.60) CYP2C19ESR1ESR2HSD17B1HSD17B2
SCHEMBL455094 0.82 CA2 (0.55) CA1CA2CYP1A2CYP2C9CYP2C19
SCHEMBL17060490 0.82 CA1 (0.82) CA1CA2CYP1A2CYP2C9CYP2C19
SCHEMBL2314239 0.82 ESR1 (0.52) CA1CA2CYP1A2CYP2C9CYP2C19
SCHEMBL8407830 0.80 CA2 (0.52) CA1CA2CYP1A2CYP2C9CYP2C19
SCHEMBL15625206 0.79 ESR1 (0.54) CA1CA2CYP1A2CYP2C9CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9718901-B2 Resin composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2017-08-01 US disclosed
US-20150118623-A1 RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2015-04-30 US disclosed