SCHEMBL16683027

SCHEMBL16683027

C=Cc1cc(OC)c(Oc2c(F)c(F)c(S(=O)(=O)O)c(F)c2F)c(OC)c1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TRPA1 O75762 1/20 0.38
▸ PSMB11 A5LHX3 1/20 0.36
▸ PSMA7 O14818 1/20 0.36
▸ PSMB1 P20618 1/20 0.36
▸ PSMA1 P25786 1/20 0.36
▸ PSMA2 P25787 1/20 0.36
▸ PSMA3 P25788 1/20 0.36
▸ PSMA4 P25789 1/20 0.36
▸ PSMB8 P28062 1/20 0.36
▸ PSMB9 P28065 1/20 0.36
▸ PSMA5 P28066 1/20 0.36
▸ PSMB4 P28070 1/20 0.36
▸ PSMB6 P28072 1/20 0.36
▸ PSMB5 P28074 1/20 0.36
▸ PSMB10 P40306 1/20 0.36
▸ PSMB3 P49720 1/20 0.36
▸ PSMB2 P49721 1/20 0.36
▸ PSMA6 P60900 1/20 0.36
▸ PSMA8 Q8TAA3 1/20 0.36
▸ PSMB7 Q99436 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16683132 0.76 L3MBTL1 (0.34) ALDH1A1GAAHPGDHSD17B10L3MBTL1
SCHEMBL14838151 0.76 CA1 (0.34) —
SCHEMBL16683026 0.75 PTGS2 (0.37) TRPA1ALDH1A1GAAKDM4EHPGD
SCHEMBL15189382 0.74 TDP1 (0.46) ALDH1A1HTTHPGDHSD17B10SMN1; SMN2
SCHEMBL16683019 0.74 TRPA1 (0.43) TRPA1ALDH1A1GAAHPGDKRAS
SCHEMBL16683024 0.73 CA12 (0.44) ALDH1A1HTTKDM4EHPGDSMN1; SMN2
SCHEMBL16683031 0.73 TDP1 (0.41) TRPA1ALDH1A1HTTHPGDHSD17B10
SCHEMBL16683010 0.72 TDP1 (0.44) ALDH1A1HTTHPGDHSD17B10SMN1; SMN2
SCHEMBL14421237 0.72 CA12 (0.41) ALDH1A1GAAHTTKDM4EHPGD
SCHEMBL2759902 0.70 F2 (0.41) HSD17B10CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20150118628-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM, METHOD OF FORMING PATTERN, PROCESS FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2015-04-30 — — US disclosed
US-20150118628-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM, METHOD OF FORMING PATTERN, PROCESS FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2015-04-30 — — US disclosed
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