Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 2/20 | 0.34 |
| ▸ | CA2 | P00918 | 2/20 | 0.34 |
| ▸ | CA12 | O43570 | 1/20 | 0.34 |
| ▸ | CA7 | P43166 | 1/20 | 0.34 |
| ▸ | CA13 | Q8N1Q1 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2742187 | 0.88 | CA1 (0.37) | CA1CA2CA12CA7CA13 | |
| SCHEMBL2000560 | 0.78 | CA1 (0.40) | CA1CA2CA12CA7CA13 | |
| SCHEMBL15189382 | 0.77 | TDP1 (0.46) | CA1CA2CA12CA7CA13 | |
| SCHEMBL16683027 | 0.76 | TRPA1 (0.38) | — | |
| SCHEMBL16683010 | 0.75 | TDP1 (0.44) | CA1CA2CA12CA7CA13 | |
| SCHEMBL16683024 | 0.73 | CA12 (0.44) | CA1CA2CA12CA7CA13 | |
| SCHEMBL17577091 | 0.73 | THRB (0.33) | — | |
| SCHEMBL16865900 | 0.73 | ALDH1A1 (0.32) | CA1CA2CA12CA7CA13 | |
| SCHEMBL2875483 | 0.72 | CA2 (0.48) | CA1CA2CA12CA7CA13 | |
| SCHEMBL261697 | 0.71 | CA1 (0.33) | CA1CA2CA12CA7CA13 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20150118628-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM, METHOD OF FORMING PATTERN, PROCESS FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2015-04-30 | — | — | US | disclosed |
| US-20150118628-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM, METHOD OF FORMING PATTERN, PROCESS FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2015-04-30 | — | — | US | disclosed |
| WO-2013047895-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND PATTERN FORMING METHOD EACH USING THE COMPOSITION, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE AND PRODUCTION METHOD OF RESIN | FUJIFILM CORPORATION (JP) | 2013-04-04 | — | — | WO | disclosed |