SCHEMBL16683050

SCHEMBL16683050

CCOC(CC(C(C)C)C(C)C)Oc1ccc(C(C)CC)cc1

nearest known ligand 0.41

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.41
TSHR P16473 2/20 0.41
SLC7A5 Q01650 1/20 0.40
MEN1 O00255 1/20 0.38
KMT2A Q03164 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
GAA P10253 2/20 0.38
MAPT P10636 1/20 0.38
NPC1 O15118 2/20 0.34
RAB9A P51151 2/20 0.34
LTB4R Q15722 1/20 0.34
LTB4R2 Q9NPC1 1/20 0.34
HSP90AA1 P07900 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
CYP2C9 P11712 1/20 0.32
POLB P06746 1/20 0.32
SMN1; SMN2 Q16637 2/20 0.32
HPGD P15428 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15279312 0.88 LTB4R (0.33) ALDH1A1TSHRSLC7A5LTB4RLTB4R2
SCHEMBL14838085 0.88 ALDH1A1 (0.43) ALDH1A1TSHRSLC7A5MEN1KMT2A
SCHEMBL111931 0.85 ALDH1A1 (0.46) ALDH1A1TSHRSLC7A5MEN1KMT2A
SCHEMBL16683104 0.79 ALDH1A1 (0.41) ALDH1A1TSHRSLC7A5MEN1KMT2A
SCHEMBL18473528 0.79 SLC7A5 (0.46) ALDH1A1TSHRSLC7A5MEN1KMT2A
SCHEMBL16683054 0.79 ALDH1A1 (0.38) ALDH1A1TSHRSLC7A5MEN1KMT2A
SCHEMBL16683097 0.78 ALDH1A1 (0.37) ALDH1A1TSHRSLC7A5MEN1KMT2A
SCHEMBL11922874 0.78 SLC7A5 (0.48) ALDH1A1TSHRSLC7A5MEN1KMT2A
SCHEMBL2607792 0.78 ALDH1A1 (0.45) ALDH1A1TSHRSLC7A5MEN1KMT2A
SCHEMBL85939 0.77 ALDH1A1 (0.47) ALDH1A1TSHRSLC7A5MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20150293446-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-10-15 US disclosed
US-20150118628-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM, METHOD OF FORMING PATTERN, PROCESS FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2015-04-30 US disclosed