SCHEMBL1669178

SCHEMBL1669178

O=Cc1ccc(-c2cccc(-c3ccc(C=O)cc3)c2)cc1

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
DRD1 P21728 2/20 0.59
TRIM24 O15164 1/20 0.55
TRIM33 Q9UPN9 1/20 0.55
CA12 O43570 2/20 0.53
CA2 P00918 2/20 0.53
CA9 Q16790 2/20 0.53
CA1 P00915 1/20 0.53
KIF11 P52732 1/20 0.50
MEN1 O00255 1/20 0.48
ESR1 P03372 1/20 0.48
KMT2A Q03164 1/20 0.48
CYP2A6 P11509 2/20 0.48
ALDH1A1 P00352 2/20 0.48
ELANE P08246 1/20 0.47
ASIC1 P78348 1/20 0.44
HSD17B10 Q99714 1/20 0.44
ALDH5A1 P51649 1/20 0.44
ABAT P80404 1/20 0.44
PRKDC P78527 1/20 0.43
CYP3A4 P08684 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13617691 0.95 ALDH1A1 (0.56) DRD1TRIM24TRIM33CA12CA2
SCHEMBL29936396 0.95 ALDH1A1 (0.56) DRD1TRIM24TRIM33CA12CA2
SCHEMBL29936157 0.95 ALDH1A1 (0.56) DRD1TRIM24TRIM33CA12CA2
SCHEMBL5711166 0.92 CYP2A6 (0.55) DRD1TRIM24TRIM33CA12CA2
SCHEMBL29700451 0.91 TRIM24 (0.67) DRD1TRIM24TRIM33CA12CA2
SCHEMBL5916092 0.91 TRIM24 (0.67) DRD1TRIM24TRIM33CA12CA2
Hydrochloric Acid SCHEMBL27796624 0.90 DRD1 (0.53) DRD1TRIM24TRIM33CA12CA2
Hydrochloric Acid SCHEMBL7795298 0.89 TRIM24 (0.65) DRD1TRIM24TRIM33CA12CA2
SCHEMBL16381738 0.88 ALDH1A1 (0.59) DRD1TRIM24TRIM33CA12CA2
Benzaldehyde SCHEMBL28675359 0.88 ALDH1A1 (0.67) DRD1TRIM24TRIM33CA12CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-122025788-A Preparation method and application of lithium ion gel electrolyte containing functional coupling 3D COFs material 北京化工大学 2026-05-12 CN claimed
CN-118497980-B Porous covalent organic framework nanofiber membrane and preparation method thereof 东华大学 2024-11-05 CN claimed
CN-118027327-B COFs material capable of improving carrier separation efficiency and preparation method and application thereof 生态环境部南京环境科学研究所 2024-10-25 CN claimed
CN-118497980-A Porous covalent organic framework nanofiber membrane and preparation method thereof 东华大学 2024-08-16 CN claimed
CN-118027327-A COFs material capable of improving carrier separation efficiency and preparation method and application thereof 生态环境部南京环境科学研究所 2024-05-14 CN claimed
CN-118497980-B Porous covalent organic framework nanofiber membrane and preparation method thereof 东华大学 2024-11-05 CN disclosed
CN-118027327-B COFs material capable of improving carrier separation efficiency and preparation method and application thereof 生态环境部南京环境科学研究所 2024-10-25 CN disclosed
CN-118497980-A Porous covalent organic framework nanofiber membrane and preparation method thereof 东华大学 2024-08-16 CN disclosed
CN-118027327-A COFs material capable of improving carrier separation efficiency and preparation method and application thereof 生态环境部南京环境科学研究所 2024-05-14 CN disclosed
EP-1830228-B1 COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION MITSUBISHI GAS CHEMICAL CO (JP) 2015-08-05 EP disclosed
EP-2808736-A2 Compound for resist and radiation-sensitive composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2014-12-03 EP disclosed
US-8802353-B2 Compound for resist and radiation-sensitive composition specification MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2014-08-12 US disclosed
US-8350096-B2 Compound for resist and radiation-sensitive composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2013-01-08 US disclosed
US-20130004896-A1 COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION SPECIFICATION ECHIGO MASATOSHI (JP) 2013-01-03 US disclosed
US-20110165516-A1 COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION ECHIGO MASATOSHI 2011-07-07 US disclosed
CN-101088046-B Compound for resist and radiation-sensitive composition MITSUBISHI GAS CHEMICAL CO 2011-05-25 CN disclosed
US-7919223-B2 Polyphenol compound synthesized by condensation between aromatic ketone or aldehyde and a phenol; acid-amplified, non-polymeric resist; highly sensitive to KrF excimer lasers, extreme ultraviolet rays, electron beams, X-rays; resist patterns with high resolution, high heat, etch resistance MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2011-04-05 US disclosed
US-20080113294-A1 Compound for Resist and Radiation-Sensitive Composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2008-05-15 US disclosed
CN-101088046-A Compound for resist and radiation-sensitive composition MITSUBISHI GAS CHEMICAL CO (JP) 2007-12-12 CN disclosed
EP-1830228-A1 COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2007-09-05 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110165516-A1 COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION XRCC6, XRCC5, KISS1R DRD1 1221/4885TRIM24 1575/4885TRIM33 1322/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.