Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM1A | O60341 | 5/20 | 0.49 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.43 |
| ▸ | NPC1 | O15118 | 2/20 | 0.42 |
| ▸ | RAB9A | P51151 | 2/20 | 0.42 |
| ▸ | MAPT | P10636 | 3/20 | 0.41 |
| ▸ | PLA2G4A | P47712 | 1/20 | 0.41 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.40 |
| ▸ | ADORA2A | P29274 | 1/20 | 0.36 |
| ▸ | ADORA1 | P30542 | 1/20 | 0.36 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
| ▸ | FPR3 | P25089 | 1/20 | 0.34 |
| ▸ | FPR2 | P25090 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16369857 | 0.87 | KDM1A (0.47) | KDM1AALDH1A1NPC1RAB9AMAPT | |
| SCHEMBL1808582 | 0.87 | L3MBTL1 (0.55) | KDM1AALDH1A1PLA2G4AL3MBTL1 | |
| SCHEMBL25446547 | 0.85 | ALDH1A1 (0.39) | KDM1AALDH1A1NPC1RAB9AMAPT | |
| SCHEMBL15652132 | 0.85 | HTR2B (0.45) | KDM1AALDH1A1NPC1RAB9AMAPT | |
| SCHEMBL24130265 | 0.85 | ALDH1A1 (0.39) | KDM1AALDH1A1NPC1RAB9AMAPT | |
| SCHEMBL4683786 | 0.85 | KDM1A (0.46) | KDM1AALDH1A1NPC1RAB9AMAPT | |
| SCHEMBL15933940 | 0.82 | MAPT (0.51) | KDM1AALDH1A1NPC1RAB9AMAPT | |
| SCHEMBL16371343 | 0.82 | MAPT (0.45) | KDM1AALDH1A1NPC1RAB9AMAPT | |
| SCHEMBL25446548 | 0.82 | PLA2G4A (0.46) | KDM1AALDH1A1NPC1RAB9AMAPT | |
| SCHEMBL17716403 | 0.82 | KDM1A (0.41) | KDM1AALDH1A1NPC1RAB9AMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2808736-B1 | Compound for resist and radiation-sensitive composition | MITSUBISHI GAS CHEMICAL CO (JP) | 2018-07-18 | — | — | EP | claimed |
| EP-2808736-A2 | Compound for resist and radiation-sensitive composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-12-03 | — | — | EP | claimed |
| EP-2662727-A2 | Compound for resist and radiation-sensitive composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2013-11-13 | — | — | EP | claimed |
| CN-218608963-U | Constant temperature agitating unit convenient to equipment | 滕州市悟通香料有限责任公司 | 2023-03-14 | — | — | CN | disclosed |
| EP-2808736-B1 | Compound for resist and radiation-sensitive composition | MITSUBISHI GAS CHEMICAL CO (JP) | 2018-07-18 | — | — | EP | disclosed |
| EP-2808736-A2 | Compound for resist and radiation-sensitive composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-12-03 | — | — | EP | disclosed |
| US-8802353-B2 | Compound for resist and radiation-sensitive composition specification | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-08-12 | — | — | US | disclosed |
| EP-2662727-A2 | Compound for resist and radiation-sensitive composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2013-11-13 | — | — | EP | disclosed |
| US-8350096-B2 | Compound for resist and radiation-sensitive composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2013-01-08 | — | — | US | disclosed |
| US-20130004896-A1 | COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION SPECIFICATION | ECHIGO MASATOSHI (JP) | 2013-01-03 | — | — | US | disclosed |
| US-20110165516-A1 | COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION | ECHIGO MASATOSHI | 2011-07-07 | — | — | US | disclosed |
| CN-101088046-B | Compound for resist and radiation-sensitive composition | MITSUBISHI GAS CHEMICAL CO | 2011-05-25 | — | — | CN | disclosed |
| US-7919223-B2 | Polyphenol compound synthesized by condensation between aromatic ketone or aldehyde and a phenol; acid-amplified, non-polymeric resist; highly sensitive to KrF excimer lasers, extreme ultraviolet rays, electron beams, X-rays; resist patterns with high resolution, high heat, etch resistance | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2011-04-05 | — | — | US | disclosed |
| US-20080113294-A1 | Compound for Resist and Radiation-Sensitive Composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2008-05-15 | — | — | US | disclosed |
| CN-101088046-A | Compound for resist and radiation-sensitive composition | MITSUBISHI GAS CHEMICAL CO (JP) | 2007-12-12 | — | — | CN | disclosed |
| EP-1830228-A1 | COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2007-09-05 | — | — | EP | disclosed |
| EP-0545085-B1 | Process for obtaining 2-acetyl-1-pyrroline in encapsulated form, intermediates and final product | NESTLE SA (CH) | 2000-03-01 | — | — | EP | disclosed |
| EP-0535713-B1 | Use of carbomethoxy-2-pyrroline-1 | NESTLE SA (CH) | 1995-04-19 | — | — | EP | disclosed |
| EP-0545085-A1 | Process for obtaining 2-acetyl-1-pyrroline in encapsulated form, intermediates and final product | SOCIETE DES PRODUITS NESTLE S.A. (CH) | 1993-06-09 | — | — | EP | disclosed |
| EP-0535713-A1 | Use of carbomethoxy-2-pyrroline-1 | SOCIETE DES PRODUITS NESTLE S.A. (CH) | 1993-04-07 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110165516-A1 | COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION | XRCC6, XRCC5, KISS1R | KDM1A 13/4885ALDH1A1 1170/4885NPC1 3988/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.