SCHEMBL16694372

SCHEMBL16694372

Cc1c[nH]cn1.[Cu]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2513 0.97
Ammonia Solution, Strong SCHEMBL28242554 0.94
Ethane SCHEMBL15300165 0.94
SCHEMBL6169040 0.94
Iodide SCHEMBL13274496 0.94
SCHEMBL4304356 0.87
Piperazine SCHEMBL3259121 0.85
SCHEMBL18917184 0.78 ALDH1A1 (0.64)
SCHEMBL8563693 0.76 NPC1 (0.30)
1-Methylimidazole SCHEMBL11120817 0.75 QPCT (0.56)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104471108-B Copper coating forming agent and method for forming copper coating 四国化成工业株式会社 2020-05-05 CN disclosed
US-10405422-B2 Copper film-forming agent and method for forming copper film SHIKOKU CHEMICALS CORPORATION (JP) 2019-09-03 US disclosed
US-20150189748-A1 COPPER FILM-FORMING AGENT AND METHOD FOR FORMING COPPER FILM SHIKOKU CHEMICALS CORPORATION (JP) 2015-07-02 US disclosed
EP-2871260-A1 COPPER FILM-FORMING AGENT AND METHOD FOR FORMING COPPER FILM Shikoku Chemicals Corporation (JP) 2015-05-13 EP disclosed
CN-104471108-A Copper film-forming agent and method for forming copper film SHIKOKU CHEM 2015-03-25 CN disclosed