⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17898451 | 0.88 | ALDH1A1 (0.31) | — | |
| SCHEMBL13614012 | 0.81 | ADORA3 (0.30) | — | |
| SCHEMBL13614002 | 0.79 | CYP4F2 (0.30) | — | |
| SCHEMBL16706510 | 0.79 | — | — | |
| SCHEMBL16590989 | 0.76 | RIPK1 (0.36) | — | |
| SCHEMBL13614018 | 0.70 | GPR84 (0.35) | — | |
| SCHEMBL16746647 | 0.69 | — | — | |
| SCHEMBL17898452 | 0.66 | — | — | |
| SCHEMBL14521355 | 0.65 | ALDH1A1 (0.54) | — | |
| SCHEMBL13614009 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9291896-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, manufacturing method of electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2016-03-22 | — | — | US | disclosed |
| US-20150132687-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-05-14 | — | — | US | disclosed |