4-Vinylphenol

4-Vinylphenol

SCHEMBL16736992

C=Cc1ccc(O)cc1.COC(=O)C1=CC2C=CC1C2

nearest known ligand 0.36

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 3/20 0.36
CA2 P00918 3/20 0.36
CA12 O43570 2/20 0.36
CA7 P43166 2/20 0.36
CA9 Q16790 2/20 0.36
CA14 Q9ULX7 2/20 0.36
TYR P14679 1/20 0.35
BACE1 P56817 2/20 0.35
SLC6A2 P23975 1/20 0.34
SLC6A4 P31645 1/20 0.34
SLC6A3 Q01959 1/20 0.34
MIF P14174 1/20 0.33
MEN1 O00255 2/20 0.33
KMT2A Q03164 2/20 0.33
ESR1 P03372 1/20 0.33
POLB P06746 1/20 0.33
MAPT P10636 1/20 0.33
RAB9A P51151 1/20 0.33
MCL1 Q07820 1/20 0.33
MMP2 P08253 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21711254 0.82 KDM4E (0.36) CA1CA2CA12CA7CA9
SCHEMBL4169291 0.82 KDM4E (0.36) CA1CA2CA12CA7CA9
SCHEMBL18714029 0.69 KDM4E (0.30) ALDH1A1
SCHEMBL18758051 0.69 KDM4E (0.32) ALDH1A1
Methyl Benzoate SCHEMBL8982921 0.68 TSHR (0.61) CA1CA2CA12CA7CA9
4-Vinylphenol SCHEMBL482612 0.67 CA1 (0.58) CA1CA2CA12CA7CA9
SCHEMBL11533080 0.66 CA12 (0.36) CA1CA2CA12CA7CA9
4-Vinylphenol SCHEMBL482393 0.65 ALDH1A1 (0.52) CA1CA2CA12CA7CA9
SCHEMBL181754 0.65 ALDH1A1 (0.68) CA1CA2CA12CA7CA9
SCHEMBL11525930 0.64 ALDH1A1 (0.41) SLC6A2ESR1POLBRAB9AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9316915-B2 Negative resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-04-19 US disclosed
US-20150147698-A1 NEGATIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-05-28 US disclosed
US-20150147697-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-05-28 US disclosed