SCHEMBL16745525

SCHEMBL16745525

CCCCC(CC)C(=O)/C(=N\OS(=O)(=O)c1ccc(C)cc1)c1nc2ccccc2s1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ GAA P10253 2/20 0.40
▸ CYP3A4 P08684 2/20 0.40
▸ MAPT P10636 2/20 0.40
▸ CYP2C9 P11712 2/20 0.40
▸ KDM4E B2RXH2 2/20 0.39
▸ TDP1 Q9NUW8 2/20 0.39
▸ GLO1 Q04760 1/20 0.39
▸ ALDH1A1 P00352 4/20 0.38
▸ MEN1 O00255 3/20 0.38
▸ KMT2A Q03164 3/20 0.38
▸ LMNA P02545 1/20 0.38
▸ MAPK1 P28482 1/20 0.38
▸ HTT P42858 1/20 0.38
▸ SMN1; SMN2 Q16637 4/20 0.38
▸ NPC1 O15118 3/20 0.38
▸ RAB9A P51151 3/20 0.38
▸ CYP1A2 P05177 2/20 0.38
▸ CYP2C19 P33261 2/20 0.38
▸ NFKB1 P19838 1/20 0.38
▸ STAT1 P42224 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16381782 0.84 ALOX15 (0.46) GAACYP3A4MAPTCYP2C9KDM4E
SCHEMBL17364364 0.81 ALDH1A1 (0.47) GAACYP3A4MAPTCYP2C9KDM4E
SCHEMBL16381785 0.81 MAPT (0.45) GAACYP3A4MAPTCYP2C9KDM4E
SCHEMBL16381778 0.80 MAPT (0.44) GAACYP3A4MAPTCYP2C9KDM4E
SCHEMBL16381779 0.78 HDAC1 (0.43) GAAMAPTKDM4EALDH1A1MEN1
SCHEMBL16381787 0.78 GLO1 (0.44) GAACYP3A4MAPTCYP2C9KDM4E
SCHEMBL16745521 0.77 MAPT (0.43) GAACYP3A4MAPTCYP2C9KDM4E
SCHEMBL16745516 0.75 ALOX15 (0.41) GAACYP3A4MAPTKDM4EALDH1A1
SCHEMBL16745519 0.74 ALOX15 (0.44) MAPTALDH1A1LMNAMAPK1HTT
SCHEMBL18212184 0.72 ALDH1A1 (0.46) MAPTALDH1A1MEN1KMT2ALMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20160131976-A1 RESIST COMPOSITION FOR SEMICONDUCTOR MANUFACTURING PROCESS; RESIST FILM, RESIST-COATED MASK BLANKS, PHOTOMASK, AND RESIST PATTERNING METHOD USING SAID RESIST COMPOSITION; ELECTRONIC-DEVICE MANUFACTURING METHOD; AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2016-05-12 — — US disclosed
US-20160131976-A1 RESIST COMPOSITION FOR SEMICONDUCTOR MANUFACTURING PROCESS; RESIST FILM, RESIST-COATED MASK BLANKS, PHOTOMASK, AND RESIST PATTERNING METHOD USING SAID RESIST COMPOSITION; ELECTRONIC-DEVICE MANUFACTURING METHOD; AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2016-05-12 — — US disclosed
US-9223211-B2 Photosensitive resin compositions, processes for preparing cured films, the resulting cured films, organic EL display devices and liquid crystal display devices FUJIFILM CORPORATION (JP) 2015-12-29 — — US disclosed
US-9223211-B2 Photosensitive resin compositions, processes for preparing cured films, the resulting cured films, organic EL display devices and liquid crystal display devices FUJIFILM CORPORATION (JP) 2015-12-29 — — US disclosed
US-20150148546-A1 PHOTOSENSITIVE RESIN COMPOSITIONS, PROCESSES FOR PREPARING CURED FILMS, THE RESULTING CURED FILMS, ORGANIC EL DISPLAY DEVICES AND LIQUID CRYSTAL DISPLAY DEVICES FUJIFILM CORPORATION (JP) 2015-05-28 — — US disclosed
US-20150148546-A1 PHOTOSENSITIVE RESIN COMPOSITIONS, PROCESSES FOR PREPARING CURED FILMS, THE RESULTING CURED FILMS, ORGANIC EL DISPLAY DEVICES AND LIQUID CRYSTAL DISPLAY DEVICES FUJIFILM CORPORATION (JP) 2015-05-28 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20150148546-A1 PHOTOSENSITIVE RESIN COMPOSITIONS, PROCESSES FOR PREPARING CURED FILMS, THE RESULTING CURED FILMS, ORGANIC EL DISPLAY DEVICES AND LIQUID CRYSTAL DISPLAY DEVICES LCP1, ARCN1, RARA GAA 2427/4885CYP3A4 3802/4885MAPT 334/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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