Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.50 |
| ▸ | HPGD | P15428 | 1/20 | 0.46 |
| ▸ | LMNA | P02545 | 2/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 4/20 | 0.41 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.41 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.41 |
| ▸ | PKM | P14618 | 1/20 | 0.41 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.41 |
| ▸ | ELANE | P08246 | 1/20 | 0.41 |
| ▸ | NPC1 | O15118 | 3/20 | 0.40 |
| ▸ | RAB9A | P51151 | 3/20 | 0.40 |
| ▸ | BCAT2 | O15382 | 1/20 | 0.40 |
| ▸ | POLB | P06746 | 1/20 | 0.39 |
| ▸ | APEX1 | P27695 | 1/20 | 0.39 |
| ▸ | HTT | P42858 | 1/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.39 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3180135 | 0.86 | TSHR (0.53) | TSHRHPGDSMN1; SMN2CYP1A2CYP2D6 | |
| SCHEMBL10531702 | 0.85 | TSHR (0.49) | TSHRLMNASMN1; SMN2POLBAPEX1 | |
| SCHEMBL16232460 | 0.84 | TSHR (0.51) | TSHRNPSR1KMT2ANPC1POLB | |
| SCHEMBL13801021 | 0.84 | HPGD (0.44) | TSHRHPGDLMNASMN1; SMN2KMT2A | |
| SCHEMBL296808 | 0.83 | TSHR (0.55) | TSHRHPGDSMN1; SMN2CYP1A2CYP2D6 | |
| SCHEMBL13801022 | 0.83 | POLB (0.49) | TSHRHPGDLMNASMN1; SMN2NPC1 | |
| SCHEMBL10362252 | 0.82 | ALDH1A1 (0.50) | HPGDLMNASMN1; SMN2CYP1A2CYP2D6 | |
| SCHEMBL5566856 | 0.82 | ALDH1A1 (0.50) | HPGDLMNASMN1; SMN2CYP1A2CYP2D6 | |
| SCHEMBL9446174 | 0.82 | LMNA (0.43) | HPGDLMNASMN1; SMN2CYP1A2CYP2D6 | |
| SCHEMBL9579874 | 0.82 | TSHR (0.49) | TSHRHPGDSMN1; SMN2CYP1A2CYP2D6 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116736635-B | Photosensitive resin composition, adhesive polymer, monomer, element, resist pattern manufacturing method, and printed wiring manufacturing method | 珦盛新材料(珠海)有限公司 | 2024-04-19 | — | — | CN | claimed |
| CN-116736635-A | Photosensitive resin composition, adhesive polymer, monomer, element, resist pattern manufacturing method, and printed wiring manufacturing method | 珦盛新材料(珠海)有限公司 | 2023-09-12 | — | — | CN | claimed |
| US-3993684-A | PHOTOSENSITIVE ACRYLIC ESTER POLYMERS | WESTERN LITHO PLATE & SUPPLY CO. (US) | 1976-11-23 | — | — | US | claimed |
| CN-116736635-B | Photosensitive resin composition, adhesive polymer, monomer, element, resist pattern manufacturing method, and printed wiring manufacturing method | 珦盛新材料(珠海)有限公司 | 2024-04-19 | — | — | CN | disclosed |
| CN-116736635-A | Photosensitive resin composition, adhesive polymer, monomer, element, resist pattern manufacturing method, and printed wiring manufacturing method | 珦盛新材料(珠海)有限公司 | 2023-09-12 | — | — | CN | disclosed |
| US-20210223690-A1 | PHOTOCURABLE COMPOSITION FOR IMPRINT, METHOD FOR PRODUCING FILM USING THE SAME, METHOD FOR PRODUCING OPTICAL COMPONENT USING THE SAME, METHOD FOR PRODUCING CIRCUIT BOARD USING THE SAME, AND METHOD FOR PRODUCING ELECTRONIC COMPONENT USING THE SAME | CANON KK (JP) | 2021-07-22 | — | — | US | disclosed |
| US-11037785-B2 | Method for fabricating pattern of cured product and methods for manufacturing optical component, circuit board and quartz mold replica as well as coating material for imprint pretreatment and cured product thereof | CANON KABUSHIKI KAISHA (JP) | 2021-06-15 | — | — | US | disclosed |
| US-11003073-B2 | Photocurable composition for imprint, method for producing film using the same, method for producing optical component using the same, method for producing circuit board using the same, and method for producing electronic component using the same | CANON KABUSHIKI KAISHA (JP) | 2021-05-11 | — | — | US | disclosed |
| US-20170351172-A1 | PHOTOCURABLE COMPOSITION FOR IMPRINT, METHOD FOR PRODUCING FILM USING THE SAME, METHOD FOR PRODUCING OPTICAL COMPONENT USING THE SAME, METHOD FOR PRODUCING CIRCUIT BOARD USING THE SAME, AND METHOD FOR PRODUCING ELECTRONIC COMPONENT USING THE SAME | CANON KABUSHIKI KAISHA (JP) | 2017-12-07 | — | — | US | disclosed |
| US-9040636-B2 | Hydroxy ester resins | DOW GLOBAL TECHNOLOGIES LLC (US) | 2015-05-26 | — | — | US | disclosed |
| US-20140316099-A1 | HYDROXY ESTER RESINS | BLUE CUBE IP LLC | 2014-10-23 | — | — | US | disclosed |
| US-5859722-A | Electrochromic device | NIPPOM OIL CO., LTD (JP) | 1999-01-12 | — | — | US | disclosed |
| EP-0752612-A1 | Electrochromic device | NIPPON OIL CO., LTD. (JP) | 1997-01-08 | — | — | EP | disclosed |
| US-5326821-A | Resin composition for powder coatings | UNITIKA LTD. (JP) | 1994-07-05 | — | — | US | disclosed |
| EP-0314447-B1 | Process for producing a resin composition for powder coatings. | UNITIKA LTD. (JP) | 1993-08-25 | — | — | EP | disclosed |
| US-4876311-A | Opaque synthetic resins | ROHM GMBH CHEMISCHE FABRIK (DE) | 1989-10-24 | — | — | US | disclosed |
| EP-0314447-A2 | Process for producing a resin composition for powder coatings. | UNITIKA LTD. (JP) | 1989-05-03 | — | — | EP | disclosed |
| EP-0106047-B1 | OLEFINICALLY UNSATURATED SILOXANES, PROCESS FOR THEIR PREPARATION AND THEIR USE AS REACTIVE DILUENTS IN RADICALLY CROSS-LINKABLE LACQUERING SYSTEMS | BAYER AG (DE) | 1985-10-23 | — | — | EP | disclosed |
| EP-0106047-A1 | Olefinically unsaturated siloxanes, process for their preparation and their use as reactive diluents in radically cross-linkable lacquering systems | BAYER AG (DE) | 1984-04-25 | — | — | EP | disclosed |
| US-3993684-A | PHOTOSENSITIVE ACRYLIC ESTER POLYMERS | WESTERN LITHO PLATE & SUPPLY CO. (US) | 1976-11-23 | — | — | US | disclosed |