SCHEMBL16902818

SCHEMBL16902818

Oc1ccc(C2C3CC4CC2CC(c2ccc(O)cc2)(C4)C3)cc1

nearest known ligand 0.60

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 2/20 0.60
CYP2C9 P11712 1/20 0.60
ESR2 Q92731 1/20 0.60
LMNA P02545 4/20 0.49
ALDH1A1 P00352 4/20 0.49
MEN1 O00255 3/20 0.45
KMT2A Q03164 3/20 0.45
GAA P10253 3/20 0.45
POLB P06746 1/20 0.45
GFER P55789 1/20 0.45
EPHX2 P34913 4/20 0.41
NPC1 O15118 1/20 0.40
MAPT P10636 2/20 0.38
RAB9A P51151 1/20 0.37
L3MBTL1 Q9Y468 1/20 0.36
XBP1 P17861 1/20 0.35
CNR2 P34972 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27092140 0.85 ALDH1A1 (0.70) ESR1CYP2C9ESR2LMNAALDH1A1
SCHEMBL7104226 0.83 LMNA (0.49) ESR1CYP2C9ESR2LMNAALDH1A1
SCHEMBL24559531 0.82 LMNA (0.63) ESR1LMNAALDH1A1MEN1KMT2A
SCHEMBL22644196 0.82 LMNA (0.63) ESR1LMNAALDH1A1MEN1KMT2A
SCHEMBL345588 0.82 LMNA (0.63) ESR1LMNAALDH1A1MEN1KMT2A
SCHEMBL7103212 0.80 LMNA (0.45) ESR1CYP2C9ESR2LMNAALDH1A1
SCHEMBL6851086 0.79 ALDH1A1 (0.47) ESR1CYP2C9ESR2LMNAALDH1A1
SCHEMBL31042568 0.79 ESR2 (0.64) ESR1CYP2C9ESR2LMNAALDH1A1
SCHEMBL20789695 0.78 LMNA (0.50) ESR1ESR2LMNAALDH1A1MEN1
SCHEMBL22084311 0.78 NPC1 (0.44) ESR1CYP2C9ESR2LMNAALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9310681-B2 Negative resist composition and patterning process using same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-04-12 US disclosed
US-9310681-B2 Negative resist composition and patterning process using same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-04-12 US disclosed
US-20150198883-A1 NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-07-16 US disclosed
US-20150198883-A1 NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-07-16 US disclosed