Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.53 |
| ▸ | TSHR | P16473 | 1/20 | 0.53 |
| ▸ | FAAH | O00519 | 1/20 | 0.50 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.50 |
| ▸ | HRH1 | P35367 | 2/20 | 0.47 |
| ▸ | LTA4H | P09960 | 1/20 | 0.47 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.45 |
| ▸ | PARP10 | Q53GL7 | 1/20 | 0.43 |
| ▸ | HRH3 | Q9Y5N1 | 8/20 | 0.42 |
| ▸ | ACACB | O00763 | 2/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12489770 | 1.00 | ALDH1A1 (0.53) | ALDH1A1TSHRFAAHEPHX2HRH1 | |
| SCHEMBL4661973 | 0.92 | ALDH1A1 (0.58) | ALDH1A1TSHRFAAHEPHX2HRH1 | |
| SCHEMBL7538656 | 0.92 | ALDH1A1 (0.63) | ALDH1A1TSHRFAAHEPHX2HRH1 | |
| SCHEMBL6671079 | 0.90 | ALDH1A1 (0.61) | ALDH1A1TSHRFAAHEPHX2HRH1 | |
| SCHEMBL19050238 | 0.87 | HRH1 (0.66) | ALDH1A1TSHRFAAHEPHX2HRH1 | |
| SCHEMBL16902888 | 0.84 | FURIN (0.56) | ALDH1A1TSHRFAAHEPHX2HRH1 | |
| SCHEMBL24925776 | 0.83 | ALDH1A1 (0.54) | ALDH1A1TSHRHRH1ALOX12PARP10 | |
| SCHEMBL25361519 | 0.82 | LTA4H (0.42) | ALDH1A1TSHRFAAHEPHX2HRH1 | |
| SCHEMBL8002002 | 0.80 | SLC5A2 (0.47) | ALDH1A1TSHRFAAHEPHX2LTA4H | |
| SCHEMBL3348834 | 0.80 | EPHX2 (0.48) | FAAHEPHX2HRH3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9310681-B2 | Negative resist composition and patterning process using same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-12 | — | — | US | disclosed |
| US-9310681-B2 | Negative resist composition and patterning process using same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-12 | — | — | US | disclosed |
| US-20150198883-A1 | NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-16 | — | — | US | disclosed |
| US-20150198883-A1 | NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-16 | — | — | US | disclosed |