SCHEMBL1697104

SCHEMBL1697104

C=C(C)C(=O)OCCC(=O)OC1CC(C)(C)OC1=O

nearest known ligand 0.36

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.36
ALDH1A1 P00352 1/20 0.35
THRB P10828 1/20 0.34
CA1 P00915 1/20 0.33
CA2 P00918 1/20 0.33
POLB P06746 1/20 0.32
APEX1 P27695 1/20 0.32
HTT P42858 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
NPC1 O15118 1/20 0.32
KDM4E B2RXH2 1/20 0.30
NLRP3 Q96P20 1/20 0.30
SMN1; SMN2 Q16637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL685728 0.87 ALDH1A1 (0.37) TSHRALDH1A1CA1CA2NPC1
SCHEMBL12651227 0.84 NPC1 (0.31) NPC1KDM4ENLRP3
SCHEMBL1697094 0.82 TSHR (0.37) TSHRALDH1A1THRBNLRP3
SCHEMBL449109 0.82 OPRM1 (0.34) ALDH1A1NPC1KDM4ESMN1; SMN2
SCHEMBL1697099 0.78 MAPK1 (0.45) TSHRALDH1A1THRBPOLBKDM4E
SCHEMBL12783112 0.77 EPHX2 (0.33) NPC1KDM4ENLRP3
SCHEMBL14341637 0.76 MAPK1 (0.44) TSHRALDH1A1THRBPOLBKDM4E
SCHEMBL12783092 0.76 KDM4E (0.33) ALDH1A1NPC1KDM4ESMN1; SMN2
SCHEMBL1697100 0.76 ALDH1A1 (0.36) TSHRALDH1A1THRBPOLBAPEX1
SCHEMBL10027359 0.75 ALDH1A1 (0.32) TSHRALDH1A1THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9229320-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-01-05 US disclosed
US-8993210-B2 Salt and photoresist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2015-03-31 US disclosed
US-8574811-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-11-05 US disclosed
US-8530135-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-09-10 US disclosed
US-8530137-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-09-10 US disclosed
US-8481242-B2 Salt and photoresist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-07-09 US disclosed
US-8431326-B2 Salt and photoresist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-04-30 US disclosed
US-8426106-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-04-23 US disclosed
US-8304164-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-11-06 US disclosed
US-20120088190-A1 SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-04-12 US disclosed
US-20120028188-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-02-02 US disclosed
US-20110200936-A1 SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-08-18 US disclosed
US-20110200935-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-08-18 US disclosed
US-20110171575-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-07-14 US disclosed
US-20110117494-A1 SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-05-19 US disclosed
US-20110117493-A1 SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-05-19 US disclosed
US-20110111342-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY LIMITED (JP) 2011-05-12 US disclosed
US-20110091807-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-04-21 US disclosed
US-20110076617-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-03-31 US disclosed
US-20110065047-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICHAL COMPANY, LIMITED (JP) 2011-03-17 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (7 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110065047-A1 PHOTORESIST COMPOSITION C1R, C1S, RER1 TSHR 2504/4885ALDH1A1 1016/4885THRB 4469/4885
US-20110117493-A1 SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME C1S, C1R, AFF1 TSHR 355/4885ALDH1A1 3861/4885THRB 1425/4885
US-20110200935-A1 PHOTORESIST COMPOSITION C1R, F12, C1S TSHR 2611/4885ALDH1A1 2022/4885THRB 4040/4885
US-20110117494-A1 SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME C1S, C1R, AFF1 TSHR 253/4885ALDH1A1 4110/4885THRB 1365/4885
US-20110091807-A1 PHOTORESIST COMPOSITION H1-0, H1-2, H1-3 TSHR 3037/4885ALDH1A1 1807/4885THRB 3982/4885
US-20120088190-A1 SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME AFF1, FGFR1, FRG1 TSHR 834/4885ALDH1A1 2566/4885THRB 3196/4885
US-20110200936-A1 SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME RER1, AFF1, FRG1 TSHR 419/4885ALDH1A1 2966/4885THRB 2057/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.