⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fluoride SCHEMBL28326051 | 0.96 | IDO1 (0.44) | — | |
| Hydrogen Sulfide SCHEMBL28251643 | 0.96 | — | — | |
| Methyl Alcohol SCHEMBL28059397 | 0.89 | APP (0.43) | — | |
| Formaldehyde SCHEMBL22288207 | 0.89 | FAAH (0.44) | — | |
| SCHEMBL6561405 | 0.82 | METAP2 (0.50) | — | |
| Formic Acid SCHEMBL27985822 | 0.82 | APP (0.43) | — | |
| Formamide SCHEMBL28129089 | 0.82 | IDO1 (0.41) | — | |
| SCHEMBL27719531 | 0.82 | LMNA (0.40) | — | |
| SCHEMBL6561473 | 0.82 | ACHE (0.46) | — | |
| Benzenethiol SCHEMBL27864206 | 0.80 | IDO1 (0.35) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 4400 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119019211-A | Method for synthesizing diacetylene benzene | 珠海固瑞泰复合材料有限公司 | 2024-11-26 | — | — | CN | claimed |
| CN-118561921-A | Binuclear ruthenium metal complex, preparation method thereof and electrochemical sensing application | 东南大学 | 2024-08-30 | — | — | CN | claimed |
| CN-114634487-B | Preparation method of quinoline feed additive with immunity improving function | 河南湾流生物科技有限公司 | 2024-08-13 | — | — | CN | claimed |
| CN-114426562-B | Platinum (II) complex containing carboline structure, preparation method and application thereof, and organic photoelectric device | 中国石油化工股份有限公司 | 2023-12-08 | — | — | CN | claimed |
| CN-116801647-A | Organic solar cell and preparation method thereof | 杭州柯林电气股份有限公司 | 2023-09-22 | — | — | CN | claimed |
| CN-116178999-A | High-temperature-resistant rust-bearing anticorrosive paint and preparation method thereof | 互邦科技保定有限公司 | 2023-05-30 | — | — | CN | claimed |
| CN-115304617-A | Synthesis method of oxaspiro diphenol with large steric hindrance and diphosphine ligand thereof | 惠州凯特立斯科技有限公司 | 2022-11-08 | — | — | CN | claimed |
| CN-114618450-B | Conjugated microporous polymer composite material, preparation method thereof and adsorbent | 北京石墨烯技术研究院有限公司 | 2022-08-02 | — | — | CN | claimed |
| CN-114634487-A | Preparation method of quinoline feed additive with function of improving immunity | 河南湾流生物科技有限公司 | 2022-06-17 | — | — | CN | claimed |
| CN-114618450-A | Conjugated microporous polymer composite material, preparation method thereof and adsorbent | 北京石墨烯技术研究院有限公司 | 2022-06-14 | — | — | CN | claimed |
| WO-1989008674-A1 | PROCESS FOR THE PREPARATION OF COPOLY(ARYLENE SULFIDE) | EASTMAN KODAK COMPANY (US) | 1989-09-21 | — | — | WO | claimed |
| US-4857629-A | Process for the preparation of copoly(arylene sulfide) | EASTMAN KODAK COMPANY (US) | 1989-08-15 | — | — | US | claimed |
| US-4855393-A | DIIODOAROMATIC COMPOUND, RECOVERING IODINE | EASTMAN KODAK COMPANY (US) | 1989-08-08 | — | — | US | claimed |
| WO-1989005324-A2 | PROCESS FOR THE PREPARATION OF COPOLY(ARYLENE SULFIDE) | EASTMAN KODAK COMPANY (US) | 1989-06-15 | — | — | WO | claimed |
| WO-1989004338-A1 | PROCESS FOR THE PREPARATION OF COPOLY(ARYLENE SULFIDE) | EASTMAN KODAK COMPANY (US) | 1989-05-18 | — | — | WO | claimed |
| WO-1989003850-A1 | COPOLY(ARYLENE SULFIDE) AND A PROCESS FOR THE PREPARATION THEREOF | EASTMAN KODAK COMPANY (US) | 1989-05-05 | — | — | WO | claimed |
| US-4826956-A | TO SWEEP OUT PRODUCED IODINE | EASTMAN KODAK COMPANY (US) | 1989-05-02 | — | — | US | claimed |
| US-4792600-A | FROM DIIODOAROMATIC COMPOUND AND SULFUR | EASTMAN KODAK COMPANY (US) | 1988-12-20 | — | — | US | claimed |
| EP-0070198-B1 | RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMATION METHOD USING THE SAME | Hitachi, Ltd. (JP) | 1985-06-19 | — | — | EP | claimed |
| EP-0070198-A1 | Radiation-sensitive composition and pattern-formation method using the same | Hitachi, Ltd. (JP) | 1983-01-19 | — | — | EP | claimed |